Silicon microcavity and microchannel plasma devices: spectroscopy and time-resolved optical experiments

Novel microcavity and microchannel plasma devices in Si have provided new and efficient sources of visible, ultraviolet (UV) and vacuum ultraviolet (VUV) radiation. The realization of this new platform for devices is implemented through VLSI and MEMS fabrication techniques. In this thesis, the basic physics of plasma discharges is presented, and the performance of Si microplasma devices with inverted pyramidal cavity and V-grooved channel configurations is described in some detail.

Name thesis:degree_name

M.S.

Level thesis:degree_level

Thesis

Discipline thesis:degree_discipline

Electrical & Computer Engr

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2010

Author dc:creator

• Kim, Taek-Lim

Contributors dc:contributor

• Eden, James G.

• Microplasma
• Silicon microplasma device
• microlaser
• microjet

Statement dc:rights

• Copyright 2010 Taek-Lim Kim

Language dc:language

en

Handle dc:identifier

http://hdl.handle.net/2142/15971

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/15971