Demystifying metal-assisted chemical etching of III-N materials and multi-heterojunctions: fundamentals to optoelectronic applications

Submission published under a 24 month embargo labeled 'U of I Access', the embargo will last until 2025-12-01

Name thesis:degree_name

Ph.D.

Level thesis:degree_level

Dissertation

Discipline thesis:degree_discipline

Electrical & Computer Engr

Grantor

University of Illinois at Urbana-Champaign

Year dc:date

2023

Author dc:creator

• Chan, Clarence Yat-Yin

Contributors dc:contributor

• Li, Xiuling
• Lee, Minjoo Lawrence
• Lyding, Joseph W
• Coleman, James J

• Semiconductor Processing
• Wet Etching
• Photoelectrochemical Etching
• Metal-assisted Chemical Etching
• Gan
• Iii-n Materials
• Optoelectronics
• Microled

Statement dc:rights

• Copyright 2023 Clarence Yat-yin Chan

Language dc:language

en, eng

Handle dc:identifier

https://hdl.handle.net/2142/122156

OAI identifier oai:identifier

oai:www.ideals.illinois.edu:2142/122156