Initial results for dose-to-clear reduction using the integrated circuit manufacturing with plasma activated chemical treatment (IMPACT) tool

Williams, Christian Donald

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University of Illinois at Urbana-Champaign

Initial results for dose-to-clear reduction using the integrated circuit manufacturing with plasma activated chemical treatment (IMPACT) tool

dc:creator Williams, Christian Donald

thesis:degree_name M.S.

dc:date2023

Abstract

dc:description

Submission published under a 24 month embargo labeled 'Closed Access', the embargo will last until 2025-08-01

Degree

thesis:*

Name thesis:degree_name: M.S.
Level thesis:degree_level: Thesis
Discipline thesis:degree_discipline: Nuclear, Plasma, Radiolgc Engr
Grantor: University of Illinois at Urbana-Champaign
Year dc:date: 2023

Author and committee

dc:creator, dc:contributor.*

Author dc:creator: Williams, Christian Donald
Contributors dc:contributor: Ruzic, David N
Sankaran, R. Mohan
Uddin, Rizwan

Subjects

dc:subject × 2

Rights

dc:rights

Language dc:language: en, eng

Identifiers

dc:identifier.*

Handle dc:identifier: https://hdl.handle.net/2142/121280
OAI identifier oai:identifier: oai:www.ideals.illinois.edu:2142/121280

Chain of custody

source

Harvested from: University of Illinois - Urbana-Champaign
Base URL: www.ideals.illinois.edu/oai-pmh
Last updated: 2026-07-22
Source record: OAI-PMH GetRecord

related terms

citation

Williams, Christian Donald. Initial results for dose-to-clear reduction using the integrated circuit manufacturing with plasma activated chemical treatment (IMPACT) tool. Thesis thesis, University of Illinois at Urbana-Champaign, 2023. https://hdl.handle.net/2142/121280

Initial results for dose-to-clear reduction using the integrated circuit manufacturing with plasma activated chemical treatment (IMPACT) tool

Abstract

Degree

Author and committee

Subjects

Rights

Identifiers

Chain of custody

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