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University of Illinois at Urbana-Champaign
Multi-physics modeling of plasma discharge, material removal and debris ejection in electrical discharge machining with flowing dielectric film
Abstract
dc:descriptionSubmission published under a 24 month embargo labeled 'U of I Access', the embargo will last until 2024-12-01
Degree
thesis:*- Name thesis:degree_name
- Ph.D.
- Level thesis:degree_level
- Dissertation
- Discipline thesis:degree_discipline
- Mechanical Engineering
- Grantor
- University of Illinois at Urbana-Champaign
- Year dc:date
- 2022
Author and committee
dc:creator, dc:contributor.*- Author dc:creator
-
- Tanveer, Asif
- Contributors dc:contributor
-
- Kapoor, Shiv
- Curreli, Davide
- Ferreira, Placid
- Shao, Chenhui
Subjects
dc:subject × 2Rights
dc:rights- Statement dc:rights
-
- Copyright 2022 Asif Tanveer
- Language dc:language
- en, eng
Identifiers
dc:identifier.*- Handle dc:identifier
- https://hdl.handle.net/2142/117641
- OAI identifier oai:identifier
- oai:www.ideals.illinois.edu:2142/117641