Laser assisted nano-optics processing in optical data storage

Optical lithography techniques have many advantages over other lithography methods although its resolution is limited by optical diffraction. Two optical lithography techniques, microlens array laser patterning and near-field scanning optical lithography, are presented to show their capabilities in nanostructures fabrication. Laser irradiation through microlens array is used to create nanostructures on phase-change films over a large area. Phase-change nanolithography is developed based on the microlens array patterning followed by wet chemical etching to fabricate 3D nanostructures. To further reduce the feature size, near-field scanning optical lithography is employed and the near-field distribution at the fiber tip is simulated to study its effect on the patterned features. Nanostructures fabricated are used as nano-cells for phase-change random access memory to increase its performance. In conclusion, laser-assisted nanolithography techniques are described and applied to optical data storage in this thesis.

Author dc:creator

• LIN YING

• optical data storage, nanolithography, microlens array patterning, near-field scanning optical lithography, phase-change lithography, nanofeature