{"id":{"repo_id":"nus","oai_identifier":"oai:scholarbank.nus.edu.sg:10635/13318"},"canonical_url":"https://search.dev.ndltd.org/etd/nus/oai:scholarbank.nus.edu.sg:10635/13318","repository":{"repo_id":"nus","name":"National University of Singapore","base_url":"https://scholarbank.nus.edu.sg/oai/request"},"display":{"title":"Laser assisted nano-optics processing in optical data storage","abstract":"Optical lithography techniques have many advantages over other lithography methods although its resolution is limited by optical diffraction. Two optical lithography techniques, microlens array laser patterning and near-field scanning optical lithography, are presented to show their capabilities in nanostructures fabrication. Laser irradiation through microlens array is used to create nanostructures on phase-change films over a large area. Phase-change nanolithography is developed based on the microlens array patterning followed by wet chemical etching to fabricate 3D nanostructures. To further reduce the feature size, near-field scanning optical lithography is employed and the near-field distribution at the fiber tip is simulated to study its effect on the patterned features. Nanostructures fabricated are used as nano-cells for phase-change random access memory to increase its performance. In conclusion, laser-assisted nanolithography techniques are described and applied to optical data storage in this thesis.","abstract_html":"Optical lithography techniques have many advantages over other lithography methods although its resolution is limited by optical diffraction. Two optical lithography techniques, microlens array laser patterning and near-field scanning optical lithography, are presented to show their capabilities in nanostructures fabrication. Laser irradiation through microlens array is used to create nanostructures on phase-change films over a large area. Phase-change nanolithography is developed based on the microlens array patterning followed by wet chemical etching to fabricate 3D nanostructures. To further reduce the feature size, near-field scanning optical lithography is employed and the near-field distribution at the fiber tip is simulated to study its effect on the patterned features. Nanostructures fabricated are used as nano-cells for phase-change random access memory to increase its performance. In conclusion, laser-assisted nanolithography techniques are described and applied to optical data storage in this thesis.","abstract_has_math":false,"creators":["LIN YING"],"institution":null,"degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":null,"school":null,"contributors":[],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2007,"date_issued":"2007-09-07","date_published":"2007-09-07","updated_at":"2026-07-24T03:30:47Z","subjects":["optical data storage, nanolithography, microlens array patterning, near-field scanning optical lithography, phase-change lithography, nanofeature"],"languages":[],"rights":[],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":null,"outbound_label":null,"outbound_source":null},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:creator","label":"Author","values":["LIN YING"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date.issued","label":"Date","values":["2007-09-07"]},{"key":"dc:relation.isreferencedby","label":"Dc Relation Isreferencedby","values":["https://scholarbank.nus.edu.sg/handle/10635/13318"]},{"key":"dc:type","label":"Dc Type","values":["Thesis"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["optical data storage, nanolithography, microlens array patterning, near-field scanning optical lithography, phase-change lithography, nanofeature"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier.uri","label":"Identifier URI","values":["https://scholarbank.nus.edu.sg/bitstreams/7c39d095-5464-4bbc-86f9-cbf9936d9b7a/download"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["Optical lithography techniques have many advantages over other lithography methods although its resolution is limited by optical diffraction. Two optical lithography techniques, microlens array laser patterning and near-field scanning optical lithography, are presented to show their capabilities in nanostructures fabrication. Laser irradiation through microlens array is used to create nanostructures on phase-change films over a large area. Phase-change nanolithography is developed based on the microlens array patterning followed by wet chemical etching to fabricate 3D nanostructures. To further reduce the feature size, near-field scanning optical lithography is employed and the near-field distribution at the fiber tip is simulated to study its effect on the patterned features. Nanostructures fabricated are used as nano-cells for phase-change random access memory to increase its performance. 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Phase-change nanolithography is developed based on the microlens array patterning followed by wet chemical etching to fabricate 3D nanostructures. To further reduce the feature size, near-field scanning optical lithography is employed and the near-field distribution at the fiber tip is simulated to study its effect on the patterned features. Nanostructures fabricated are used as nano-cells for phase-change random access memory to increase its performance. 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