Processing and characterization of graphene and graphene on silicon

Graphene has become a promising material for applications in many areas including electronic devices, batteries and space crafts. Although it has a bright future, the commercial production of graphene has not yet been realized. In this thesis, an overview of the properties and applications of graphene is presented. The early research of preparing graphene and its composites is summarized, which gives the basis to synthesize graphene and improve the process. In this study, graphene oxide (GO) and graphene have been successfully made using graphite; graphene layer has been coated on the surface of a silicon wafer. The resulting specimens are characterized by Raman spectroscopy and Fourier Transform Infrared (FTIR) spectroscopy to identify the composition of the resulting films. Current-Voltage (I-V) measurements are performed to determine the electrical properties of graphene on silicon. Conclusions are made based on the test results.

Name thesis:degree_name

Master of Science in Materials Science and Engineering - (M.S.)

Discipline thesis:degree_discipline

Committee for the Interdisciplinary Program in Materials Science and Engineering

Year

2015

Author dc:creator

• Peng, Cheng

Contributors dc:contributor

• N. M. Ravindra
• Michael Jaffe
• Peter Kaufman

• Graphene
• Graphene processing
• Materials Science and Engineering

Repository record dc:identifier

https://digitalcommons.njit.edu/theses/241

OAI identifier oai:identifier

oai:digitalcommons.njit.edu:theses-1240