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Massachusetts Institute of Technology

Reduction of process monitoring in semiconductor chip manufacturing

Abstract

dc:description.abstract

This thesis concerns in-line inspection scheduling policies in semiconductor chip manufacturing. Intel uses extensive monitoring (inspections) in the manufacturing process. While the inspections help safeguard process stability and boost manufacturing yield, they also account for a substantial fraction of the company's variable manufacturing costs. Intel is under pressure to cut inspections as a means of lowering these costs, and is currently pursuing an aggressive reduction policy. This thesis examines the risks and benefits of inspection reduction, and identifies competing considerations that affect the decision of how much inspection is appropriate. It proposes a decision algorithm to evaluate current inspection levels and determine the optimal frequency of inspections.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
1999

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Amar, Ajay, 1964-
Advisor dc:contributor.advisor
  • Arnold Barnett and Duane Boning.

Subjects

dc:subject × 2

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/9742
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/9742

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Amar, Ajay, 1964-. Reduction of process monitoring in semiconductor chip manufacturing. Massachusetts Institute of Technology, 1999. http://hdl.handle.net/1721.1/9742