Back to results

Massachusetts Institute of Technology

Zone plate array lithography in the deep UV

Abstract

dc:description.abstract

Initial design and development of a new paradigm in nanolithography, zone plate array lithography (ZPAL), has yielded a clearer understanding of its operation, construction, and performance. The benefits of ZPAL as a maskless strategy to write arbitrary patterns with ~ 25 nm resolution are explored. To optimize the properties of the system required proper design of zone plate focusing. Due to ZPAL's universality, the study has been conducted in the deep UV; a process to create zone plates with 250 nm theoretical spots sizes for this regime was developed. Familiarity with nanofabrication technology proved essential, especially e-beam lithography. Next, an optical setup was built replete with alignment interferometry, precision stage motion, and radiation from a 193 nm ArF laser. A rubric for the implementation of the multiplexing coupled with coordination architecture demonstrated a potentially high throughput of l cm2 / s. Moreover, the results of exposure tests show digital pattern generation from an array of beamlets. Because the ideal ZPAL system would function with x-rays, a discussion on its design and practical development has been included. Despite anticipated hurdles, spearheading this venture promises to drive lithography to its limit.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
1998

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Djomehri, Ihsan Jahed, 1976-
Advisor dc:contributor.advisor
  • Henry I. Smith.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/9626
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/9626

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Djomehri, Ihsan Jahed, 1976-. Zone plate array lithography in the deep UV. Massachusetts Institute of Technology, 1998. http://hdl.handle.net/1721.1/9626