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Massachusetts Institute of Technology

Deeply-scaled GaN high electron mobility transistors for RF applications

Abstract

dc:description.abstract

Due to the unique combination of large critical breakdown field and high electron velocity, GaN-based high electron mobility transistors (HEMTs) have great potential for next generation high power RF amplifiers. The performance of GaN devices has increased continuously in the last two decades. However, in spite of the improvements, there are still several critical issues limiting the high frequency operation of these devices. One of the key challenges is the lower-than-expected maximum current gain cutoff frequency (fT) of deeply-scaled GaN HEMTs. The fT of the short channel devices is well below both projections from maximum frequency in the long channel devices and theoretical expectations based on material properties. Another important issue is a roll-off of the device frequency performance under wide bias range, which limits the large-signal high speed operation in the deeply-scaled devices. This thesis focuses on these two important problems and investigates them both analytically and experimentally. First, through systematic study of the transistor delay, the critical factors limiting intrinsic and extrinsic device speed are clarified and several technologies are demonstrated to overcome these limits. This has allowed the demonstration of state-of-the-art high frequency performance GaN HEMTs. Second, in order to understand the origin of the decrease in device speed at high drain and gate bias, a new extraction method and novel transistor structure have been developed, which provide an excellent guide for future device optimization.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2014

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Lee, Dong Seup
Advisor dc:contributor.advisor
  • Tomás Palacios.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/87927
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/87927

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Lee, Dong Seup. Deeply-scaled GaN high electron mobility transistors for RF applications. Massachusetts Institute of Technology, 2014. http://hdl.handle.net/1721.1/87927