Design of a liquid embossing machine

A machine was designed to pattern thin films of liquid by liquid embossing. 10 designs were prototyped and evaluated according to pattern transfer, alignment, and ability to emboss large area. The final design utilizes a PDMS stamp cast such that it seals an air cavity, which is then pressurized to slightly bow the stamp. The cavity is clear so alignment can be accomplished by optical feedback using a camera and microscope objective. The theory of liquid embossing is discussed. PDMS has a very high contact angle with most fluids and so it is able to clear liquid from channels approximately 5 [mu]m wide. The wettability of the substrate is modified after being in contact with PDMS so the liquid does not reflow into the channels. Sub-micron alignment between layers was achieved. Vector plots of runout between layers are given. Electrical yield was found to be 89% and was not negatively correlated by stamp age up to 1000 dry stamps. The stamps were found to wear, but due to their conformal nature this did not affect pattern transfer. Structures created by the liquid embossing machine include electrostatic actuators, test patterns with 100 nm features, vias, under-etched metal layers, and released cantilevers.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Mechanical Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2001

Author dc:creator

• Wilhelm, Eric Jamesson, 1977-

Advisor dc:contributor.advisor

• Joseph M. Jacobson.

• Mechanical Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/8539

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/8539