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Massachusetts Institute of Technology

Simulation and fabrication of GaN-based vertical and lateral normally-off power transistors

Abstract

dc:description.abstract

This thesis is divided in two parts. First, self-consistent electro-thermal simulations have been performed for single finger and multi-finger GaN-based vertical and lateral power transistors and were validated with experimental DC characteristics. The models were used to study the thermal performance of GaN-based vertical metal oxide semiconductor field-effect transistors (MOSFETs) and the lateral high electron mobility transistors (HEMTs) designed for different breakdown voltage application and at different size scaling levels. The comparison between two structures revealed that the vertical MOSFETs have the potential to achieve an up to 50% higher thermal performance, especially for higher breakdown voltage and higher size scaling level designs. Second, normally-off lateral MOS-HEMTs were developed by the combination of fluorine plasma treatment and high-temperature gate oxide deposition. Record performances have been achieved for the fluorinated MOS-HEMTs with a threshold voltage >3.5 V, a low on-resistance ~ 2 m[Omega]·cm2, a small threshold voltage hysteresis ~0.15 V, high enhancement-mode channel mobility ~ 1000 cm2V-1s-1, a breakdown voltage ~ 780 V, no current collapse and a stability with 24 h continuous on-state operation at 250 oC. In addition, an analytical model for the threshold voltage of fluorinated MOS-HEMTs was established for the first time, to enable accurate design and engineering of the threshold voltage for MOS-HEMTs. This novel technology has been demonstrated as promising to fabricate high-performance normally-off MOS-HEMTs.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2013

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Zhang, Yuhao, Ph. D. Massachusetts Institute of Technology
Advisor dc:contributor.advisor
  • Tomás Palacios.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/82179
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/82179

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Zhang, Yuhao, Ph. D. Massachusetts Institute of Technology. Simulation and fabrication of GaN-based vertical and lateral normally-off power transistors. Massachusetts Institute of Technology, 2013. http://hdl.handle.net/1721.1/82179