The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films

Introduction: As the size of electronic and magnetic devices decreases, nanoscale patterning becomes an increasingly important area of research. Two different approaches have been taken to pattern media: top-down methods such as lithography, and bottom-up methods such as self-assembly. Top-down assembly methods have the advantages of precision and accuracy, but are hard to scale for certain industrial applications due to their low throughput. Self-assembly methods are more easily scalable for applications requiring mass production. Thus, self-assembly has attracted attention and is an area of ongoing research for its potential to create high-throughput, periodic nanoscale patterns. Block copolymers are a class of commonly-studied materials for nanoscale selfassembly. Block copolymers are long molecules that consist of "blocks" of chemically differing polymers attached end-to-end. Under the right conditions, these blocks will phase separate, spontaneously forming periodic microdomains. Diblock copolymers, which have only two blocks, have been found to form a variety of well-ordered morphologies with nanoscale periodicity ...

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2009

Author dc:creator

• Perkinson, Joy C. (Joy Clare)

Advisor dc:contributor.advisor

• Caroline A. Ross.

• Materials Science and Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/58070

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/58070