{"id":{"repo_id":"mit","oai_identifier":"oai:dspace.mit.edu:1721.1/58070"},"canonical_url":"https://search.dev.ndltd.org/etd/mit/oai:dspace.mit.edu:1721.1/58070","repository":{"repo_id":"mit","name":"MIT","base_url":"https://dspace.mit.edu/oai/request"},"display":{"title":"The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films","abstract":"Introduction: As the size of electronic and magnetic devices decreases, nanoscale patterning becomes an increasingly important area of research. Two different approaches have been taken to pattern media: top-down methods such as lithography, and bottom-up methods such as self-assembly. Top-down assembly methods have the advantages of precision and accuracy, but are hard to scale for certain industrial applications due to their low throughput. Self-assembly methods are more easily scalable for applications requiring mass production. Thus, self-assembly has attracted attention and is an area of ongoing research for its potential to create high-throughput, periodic nanoscale patterns. Block copolymers are a class of commonly-studied materials for nanoscale selfassembly. Block copolymers are long molecules that consist of \"blocks\" of chemically differing polymers attached end-to-end. Under the right conditions, these blocks will phase separate, spontaneously forming periodic microdomains. Diblock copolymers, which have only two blocks, have been found to form a variety of well-ordered morphologies with nanoscale periodicity ...","abstract_html":"Introduction: As the size of electronic and magnetic devices decreases, nanoscale patterning becomes an increasingly important area of research. Two different approaches have been taken to pattern media: top-down methods such as lithography, and bottom-up methods such as self-assembly. 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(Joy Clare)"],"institution":"Massachusetts Institute of Technology","degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":"Massachusetts Institute of Technology. Dept. of Materials Science and Engineering.","school":null,"contributors":[],"advisors":["Caroline A. Ross."],"committee_chairs":[],"committee_members":[],"year":2009,"date_issued":"2009","date_published":"2009","updated_at":"2026-07-22T22:21:22Z","subjects":["Materials Science and Engineering."],"languages":["eng"],"rights":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. 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Two different approaches have been taken to pattern media: top-down methods such as lithography, and bottom-up methods such as self-assembly. Top-down assembly methods have the advantages of precision and accuracy, but are hard to scale for certain industrial applications due to their low throughput. Self-assembly methods are more easily scalable for applications requiring mass production. Thus, self-assembly has attracted attention and is an area of ongoing research for its potential to create high-throughput, periodic nanoscale patterns. Block copolymers are a class of commonly-studied materials for nanoscale selfassembly. Block copolymers are long molecules that consist of \"blocks\" of chemically differing polymers attached end-to-end. Under the right conditions, these blocks will phase separate, spontaneously forming periodic microdomains. 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See provided URL for inquiries about permission."],"dc:rights.uri":["http://dspace.mit.edu/handle/1721.1/7582"],"dc:subject":["Materials Science and Engineering."],"dc:title":["The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films"],"dc:type":["Thesis"]},"updated_at":"2026-07-22T22:21:22Z"}