Ultra-high-aspect-ratio nanofluidic channels for high-throughput biological applications

The development of micro/nanofluidics is expected to be the enabling technology for sample preparation of proteomic biosamples, which has been the bottleneck in proteomics. Most microfabricated nanofluidic channels, such as planar nanochannels and square nanochannels, suffer from small open volume and, as a result, low sample throughput, compared to microchips and conventional gel-based systems. For practical and wider applications of artificial nanochannels, it is of crucial importance to enhance sample throughput of nanofluidic systems. To address this severe problem, we proposed to build high-aspect-ratio vertical nanochannels, which have the advantage of large open volume, enabling their use for high-throughput applications. Two fabrication methods for creating massively-parallel, ultra-high-aspect-ratio nanochannels have been developed by using a combination of anisotropic wet etching and thermal oxidation. Vertical nanochannels with a uniform gap size of 55 nm and aspect ratio as high as 400 have been demonstrated. In addition, we have implemented high-aspect-ratio nanochannels into a two-dimensional anisotropic nanofilter array (ANA) device and demonstrated continuous-flow separation of DNA and proteins. Compared to other nanofilter devices, the vertical ANA device achieves comparable separation speed and efficiency but allows a much higher sample throughput. Lastly, we have demonstrated the uniform layer-by-layer deposition of polyelectrolyte multilayers (PEM) within high-aspect-ratio nanochannels.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Mechanical Engineering.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2009

Author dc:creator

• Mao, Pan

Advisor dc:contributor.advisor

• Jongyoon Han.

• Mechanical Engineering.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/54875

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/54875