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Showing 1 to 20 of 57 for “"Wet etching"”.

  1. Photoelectrochemical Wet Etching of Gallium Nitride

    … this work, the technique of photoelectrochemical wet etching using KOH solutions has been developed for n-type GaN materials. Customized hardware and software have been assembled to carry out the etching. The etching characteristics were characterized over a wide range of process conditions. This …

    uiuc Repository record for Photoelectrochemical Wet Etching of Gallium Nitride (opens in a new tab)

  2. Removal of metal oxide defects through improved semi-anisotropic wet etching process

    … excess metal defects, evaluated recommended wet etch methods to remove nickel oxide, and finally proposes a wet etch process that will rapidly remove defects while continuing to maintain the desired semi-anisotropic etch profile, uncharacteristic of most wet immersion etch processes. Results …

    mit Repository record for Removal of metal oxide defects through improved semi-anisotropic wet etching process (opens in a new tab)

  3. Metal-assisted chemical etching of 4H silicon carbide

    Metal-assisted chemical etching (MacEtch) is a wet etching method that can produce high aspect ratio nanostructures with minimal crystal damage. The MacEtch process has been demonstrated to overcome limitations of dry and wet etching in several materials, studied extensively since its discovery by …

    uiuc Repository record for Metal-assisted chemical etching of 4H silicon carbide (opens in a new tab)

  4. Enhanced Fabrication of Microdroplet Generator Nozzle Arrays: Optimizing KOH Etching for Microfluidic Applications

    … a critical fabrication step, anisotropic wet etching of pyramidal nozzles using a basic potassium hydroxide (KOH) solution. Given the integral role of nozzle geometry in device operation, high-precision techniques including Reactive Ion Etching (RIE), Deep Reactive Ion Etching (DRIE), and …

    wustl Repository record for Enhanced Fabrication of Microdroplet Generator Nozzle Arrays: Optimizing KOH Etching for Microfluidic Applications (opens in a new tab)

  5. Electrostatic transfer of graphene grown on copper foil and nanosoldering of carbon nanotube junctions

    … graphene grown on metal substrates involves wet etching steps in order to separate graphene from its metal growth substrates. During these wet etching steps, however, residues and wrinkles can be easily introduced in graphene and degrade its quality. By using electrostatic force instead, we …

    uiuc Repository record for Electrostatic transfer of graphene grown on copper foil and nanosoldering of carbon nanotube junctions (opens in a new tab)

  6. The Development of Microfluidic Devices Fabricated From Poly(dimethyl) Siloxane

    … COT was coupled with surface immobilization and wet etching techniques to generate patterned surfaces."

    uiuc Repository record for The Development of Microfluidic Devices Fabricated From Poly(dimethyl) Siloxane (opens in a new tab)

  7. Development of process to transfer large areas of LPCVD graphene from copper foil to a porous support substrate

    … by bonding the substrates to the graphene then wet-etching the copper. The resulting membrane quality is characterized via Raman spectroscopy, scanning electron microscopy, diffraction patterning, and aberration-corrected scanning transmission electron microscopy.

    mit Repository record for Development of process to transfer large areas of LPCVD graphene from copper foil to a porous support substrate (opens in a new tab)

  8. Optically Powered Logic Transistor

    … photolithography, precise plasma or chemical wet etching, diffusion processes, and thin film evaporation. Electrical measurements were done by using an HP4156 parameter analyzer to measure several output voltage signals at one time while an illuminating the device with laser light. The …

    byu Repository record for Optically Powered Logic Transistor (opens in a new tab)

  9. Residual Stress Development and Effect on the Piezoelectric Performance of Sol -Gel Derived Lead Zirconate Titanate (Pzt) Thin Films

    … two patterning methods, traditional chemical wet-etching and a novel soft lithographic technique, are explored as a means to reduce residual stress within film features. For the soft lithographic technique, film features are created by selective film cracking, a result of poor substrate …

    uiuc Repository record for Residual Stress Development and Effect on the Piezoelectric Performance of Sol -Gel Derived Lead Zirconate Titanate (Pzt) Thin Films (opens in a new tab)

  10. MOCVD GaN sensorių su chemiškai modifikuotu paviršiumi tyrimai /

    … of this thesis was to modify GaN surface with wet etching method while using acidic (H3PO4) and basic (KOH-ethylene glycol) solutions, then use various analysis techniques to understand the defects present in the material and how they affect the electrooptical properties. The analysis methods …

    vilnius Repository record for MOCVD GaN sensorių su chemiškai modifikuotu paviršiumi tyrimai / (opens in a new tab)

  11. Engineering Substrates for the Study of Cell Mechanical Interactions

    … the application of fabrication techniques like wet etching and microcontact printing to answer fundamental biological problems. In order to isolate the effects of curvature from other factors, we have developed a technique to create features with nominally identical dimensions but varying radius …

    columbia-diss Repository record for Engineering Substrates for the Study of Cell Mechanical Interactions (opens in a new tab)

  12. Fabrication and Characterization of Torsional Micro-Hinge Structures

    … wafer. In order to create this device, both wet etching and dry etching techniques were employed to produce an 8µm thick plate structure. The bulk etching of 480µm was achieved by wet etching down into the silicon (Si) to create the wells. Dry etching was used for its high precision to …

    calpoly Repository record for Fabrication and Characterization of Torsional Micro-Hinge Structures (opens in a new tab)

  13. Fabrication and Characterization of Small Scale Photo-Electro-Chemical Solar Cells

    … silicon electrode is fabricated by controlled wet etching so that the bottom of the micro-cavity becomes a very thin membrane, which allows photons to penetrate and reach the semiconductorelectrolyte interface for the generation of excess electron-hole pairs. The separation of the excess charge …

    denver Repository record for Fabrication and Characterization of Small Scale Photo-Electro-Chemical Solar Cells (opens in a new tab)

  14. Dendritic Materials as a Dry Release Sacrificial Layer

    … process to demonstrate a dry sacrificial etching technique. An array of cantilever beams 100 mum in width by 1000 mum in length was successfully released in 10 min. In addition, an array of microchannels was fabricated to better understand the limitations of HB560 decomposition. A full …

    uiuc Repository record for Dendritic Materials as a Dry Release Sacrificial Layer (opens in a new tab)

  15. Nanowire Zinc Oxide MOSFET Pressure Sensor

    … removal, ZnO atomic layer deposition (ALD), and wet etching for nanowire release were optimized to fabricate the sensor on a silicon wafer. The ZnO nanowire fabrication sequence presented is at low temperature making it compatible with CMOS technology.

    vcu Repository record for Nanowire Zinc Oxide MOSFET Pressure Sensor (opens in a new tab)

  16. Inverse metal-assisted chemical etching of indium phosphide with sub-20 nm scalability

    Metal-assisted chemical etching (MacEtch), a wet etching method developed in 2000, has been the focus of extensive research in the area of semiconductor nanotechnology for the last decade, mainly in Si. In principle, MacEtch can be applicable to the other semiconductors if there exists a …

    uiuc Repository record for Inverse metal-assisted chemical etching of indium phosphide with sub-20 nm scalability (opens in a new tab)

  17. Fabrication and Characterization of Narrow-Stripe Quantum Well Laser Diodes

    … (subsequent to hydrogenation) by using a simple wet-etching process to form a lateral waveguide. Stripe lasers fabricated via hydrogen passivation have been demonstrated previously; however, the benefits of this method have not been fully explored or characterized. Our work aims to quantify the …

    vt Repository record for Fabrication and Characterization of Narrow-Stripe Quantum Well Laser Diodes (opens in a new tab)

  18. Metal-assisted chemical etching of III-V semiconductors for advanced optoelectronic device fabrication

    … modules in semiconductor processing including etching have been extensively explored and implemented for a wide variety of device structures. One of the most novel techniques for etching semiconductors is metal-assisted chemical etching (MacEtch), a plasma-free wet etching method that utilizes …

    uiuc Repository record for Metal-assisted chemical etching of III-V semiconductors for advanced optoelectronic device fabrication (opens in a new tab)

  19. Ultra-high-aspect-ratio nanofluidic channels for high-throughput biological applications

    … developed by using a combination of anisotropic wet etching and thermal oxidation. Vertical nanochannels with a uniform gap size of 55 nm and aspect ratio as high as 400 have been demonstrated. In addition, we have implemented high-aspect-ratio nanochannels into a two-dimensional anisotropic …

    mit Repository record for Ultra-high-aspect-ratio nanofluidic channels for high-throughput biological applications (opens in a new tab)

  20. Development of standard components for multi-degrees-of-freedom mems positioning stages with closed-loop feedback

    … processes followed by a series of dry and wet etching process steps to release the devices. The positioning loop of the fabricated device is closed using a commercially-off-the-shelf (COTS) capacitance-to-voltage conversion IC and characterized by a PID controller built into a dSPACE …

    uiuc Repository record for Development of standard components for multi-degrees-of-freedom mems positioning stages with closed-loop feedback (opens in a new tab)

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