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Massachusetts Institute of Technology

High quality metamorphic graded buffers with lattice-constants intermediate to GaAs an InP for device applications

Abstract

dc:description.abstract

We have investigated the use of a continuous, linear grading scheme for compositionally-graded metamorphic InxGal-As buffers on GaAs, which can be used as virtual substrates for optical emitters operating at wavelengths > 1.2 gm. Such virtual substrates will allow access to new materials that can be used for designing optical and electronic devices with superior characteristics and performances compared with conventional devices that are grown lattice-matched on standard substrates such as GaAs and InP. In addition, the principles behind such graded buffers can be used to bridge different lattice-constants, which can be a pathway to future integration of previously distinct classes of devices that have been defined by the lattice-constant on which they were built (e.g. Si-based, GaAs-based, InP-based etc.). Graded buffers with threading dislocation densities (TDD) < 9.5 x 104 cm-2, at a final composition of x = 0.346 were obtained, representing the lowest value ever achieved at or around this composition. Photoluminescence (PL) measurements were carried out on InGaAs quantum wells (QWs) that were re-grown on these buffers, and high luminescence efficiency was observed in the 1.2-1.5 tm wavelength range. Ridge waveguide QW-separate confinement heterostructure lasers and heterojunction bipolar transistors (HBTs) were also grown on the graded buffers to demonstrate their applicability for device applications. Pulsed threshold current densities of 262 Ac2 at room temperature were obtained for 2 mm long strained-InGaAs QW emitting at 1320 nm, with peak output powers up to 40 mW. Preliminary tests on the unoptimized HBTs revealed that they operate with dc current gains of up to 13. A new class of graded buffers using all-binary III-V semiconductors has also been demonstrated. Thin constituent layers of GaAs and InP are combined such that they act in a mechanically-similar fashion as a random alloy.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2009

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Lee, Kenneth Eng Kian
Advisor dc:contributor.advisor
  • Eugene A. Fitzgerald.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/47779
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/47779

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Lee, Kenneth Eng Kian. High quality metamorphic graded buffers with lattice-constants intermediate to GaAs an InP for device applications. Massachusetts Institute of Technology, 2009. http://hdl.handle.net/1721.1/47779