Variation reduction in a wafer fabrication line through inspection optimization

Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997, and Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1997.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Materials Science and Engineering

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

1997

Author dc:creator

• Bean, John W. (John Wellard)

Advisor dc:contributor.advisor

• Tom Eagar, Roy Welsch.

• Materials Science and Engineering
• Sloan School of Management

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/43446

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/43446