{"id":{"repo_id":"mit","oai_identifier":"oai:dspace.mit.edu:1721.1/43446"},"canonical_url":"https://search.dev.ndltd.org/etd/mit/oai:dspace.mit.edu:1721.1/43446","repository":{"repo_id":"mit","name":"MIT","base_url":"https://dspace.mit.edu/oai/request"},"display":{"title":"Variation reduction in a wafer fabrication line through inspection optimization","abstract":"Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997, and Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1997.","abstract_html":"Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997, and Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1997.","abstract_has_math":false,"creators":["Bean, John W. (John Wellard)"],"institution":"Massachusetts Institute of Technology","degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":"Massachusetts Institute of Technology. Dept. of Materials Science and Engineering","school":null,"contributors":[],"advisors":["Tom Eagar, Roy Welsch."],"committee_chairs":[],"committee_members":[],"year":1997,"date_issued":"1997","date_published":"1997","updated_at":"2026-07-22T22:22:26Z","subjects":["Materials Science and Engineering","Sloan School of Management"],"languages":["eng"],"rights":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."],"rights_urls":["http://dspace.mit.edu/handle/1721.1/7582"],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/1721.1/43446","outbound_label":"Handle","outbound_source":"dc:identifier.uri"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor.advisor","label":"Advisor","values":["Tom Eagar, Roy Welsch."]},{"key":"dc:contributor.department","label":"Department","values":["Massachusetts Institute of Technology. Dept. of Materials Science and Engineering","Sloan School of Management"]},{"key":"dc:creator","label":"Author","values":["Bean, John W. (John Wellard)"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date.accessioned","label":"Dc Date Accessioned","values":["2008-11-07T19:41:52Z"]},{"key":"dc:date.available","label":"Dc Date Available","values":["2008-11-07T19:41:52Z"]},{"key":"dc:date.issued","label":"Date","values":["1997"]},{"key":"dc:publisher","label":"Institution","values":["Massachusetts Institute of Technology"]},{"key":"dc:type","label":"Dc Type","values":["Thesis"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Materials Science and Engineering","Sloan School of Management"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language.iso","label":"Language (ISO)","values":["eng"]},{"key":"dc:rights","label":"Dc Rights","values":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."]},{"key":"dc:rights.uri","label":"Rights URI","values":["http://dspace.mit.edu/handle/1721.1/7582"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier.uri","label":"Identifier URI","values":["http://hdl.handle.net/1721.1/43446"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997, and Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1997.","Includes bibliographical references (p. 44)."]},{"key":"dc:description.degree","label":"Dc Description Degree","values":["M.S."]},{"key":"dc:title","label":"Title","values":["Variation reduction in a wafer fabrication line through inspection optimization"]}]}],"canonical_facts":{"dc:contributor.advisor":["Tom Eagar, Roy Welsch."],"dc:contributor.department":["Massachusetts Institute of Technology. Dept. of Materials Science and Engineering","Sloan School of Management"],"dc:creator":["Bean, John W. (John Wellard)"],"dc:date.accessioned":["2008-11-07T19:41:52Z"],"dc:date.available":["2008-11-07T19:41:52Z"],"dc:date.issued":["1997"],"dc:description":["Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1997, and Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1997.","Includes bibliographical references (p. 44)."],"dc:description.degree":["M.S."],"dc:identifier.uri":["http://hdl.handle.net/1721.1/43446"],"dc:language.iso":["eng"],"dc:publisher":["Massachusetts Institute of Technology"],"dc:rights":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."],"dc:rights.uri":["http://dspace.mit.edu/handle/1721.1/7582"],"dc:subject":["Materials Science and Engineering","Sloan School of Management"],"dc:title":["Variation reduction in a wafer fabrication line through inspection optimization"],"dc:type":["Thesis"]},"updated_at":"2026-07-22T22:22:26Z"}