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Massachusetts Institute of Technology

High resolution imaging and lithography using interference of light and surface plasmon waves

Abstract

dc:description.abstract

The resolution of optical imaging and lithography is limited by the wave nature of light. Studies have been undertaken to overcome the diffraction limit for imaging and lithography. In our lab, the standing wave surface plasmon resonance fluorescence (SW-SPRF) microscopy was developed. It is a combination of standing wave total internal reflection fluorescence (SW-TIRF), one of structured illumination techniques, with surface plasmon resonance (SPR). The SW-TIRF approach decreases the excitation wavelength by interfering two coherent light rays on the substrate and producing an evanescent standing wave field between the object and a high refractive index substrate. Evanescent standing wave illumination generates a sinusoidal interference pattern with 2n times higher-spatial frequency than original light, where n is the refractive index of the substrate allowing higher lateral resolution. Surface plasmon is generated by reflecting a light on the gold surface through the cover glass at a specific angle inducing collective excitation of electrons in the metal. The SPR contributes a better signal-to-noise ratio by inducing an enhanced evanescent electric field to excite fluorophores. With the SW-TIRF instrument, about 100 nm resolution was obtained. In this thesis, we aim to produce less than 50 nm resolution lithography and imaging using corrugated gold surface. The induction of surface plasmon wave with large wave number is made possible by the sinusoidal gold surface allowing wave number matching between the excitation light and the surface plasmon wave. This wave number matching requires proper optimization of parameters like grating constant, perturbation depth, incidence angle of the beam, and excitation wavelength. The fabrication of the corrugated gold surface would be done by e-beam etching with varying parameters.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Dept. of Mechanical Engineering.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2007

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Kim, Yang-Hyo
Advisor dc:contributor.advisor
  • Peter T.C. So.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/42303
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/42303

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Kim, Yang-Hyo. High resolution imaging and lithography using interference of light and surface plasmon waves. Massachusetts Institute of Technology, 2007. http://hdl.handle.net/1721.1/42303