Absorbance modulation optical lithography

In this thesis, the concept of absorbance-modulation optical lithography (AMOL) is described, and the feasibility experimentally verified. AMOL is an implementation of nodal lithography, which is not bounded by the diffraction limit of incident lights. Experimental results showed promising capability of AMOL and matched well with simulation. Several key elements of the AMOL system are discussed: the material systems of AMOL, limitations on the material and optical systems presented, and the design and fabrication of spiral phase elements that generate ring-shaped beams required by AMOL.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2007

Author dc:creator

• Tsai, Hsin-Yu Sidney

Advisor dc:contributor.advisor

• Henry I. Smith.

• Electrical Engineering and Computer Science.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/42253
• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Identifier URI

http://dspace.mit.edu/handle/1721.1/42253

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/42253