{"id":{"repo_id":"mit","oai_identifier":"oai:dspace.mit.edu:1721.1/42253"},"canonical_url":"https://search.dev.ndltd.org/etd/mit/oai:dspace.mit.edu:1721.1/42253","repository":{"repo_id":"mit","name":"MIT","base_url":"https://dspace.mit.edu/oai/request"},"display":{"title":"Absorbance modulation optical lithography","abstract":"In this thesis, the concept of absorbance-modulation optical lithography (AMOL) is described, and the feasibility experimentally verified. AMOL is an implementation of nodal lithography, which is not bounded by the diffraction limit of incident lights. Experimental results showed promising capability of AMOL and matched well with simulation. 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