Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films

In this work, a number of YBa2Cu3Ox-7 (YBCO) superconductor deposition systems developed by various laboratories are subjected to a critical review and analysis. Deficiencies in the design of these deposition processes, and deficiencies in the design of the mechanisms and tools used to carry out these processes are identified. Most of these deficiencies have resulted in either poor end-product performance or unlikely commercial viability. For example: pulsed laser deposition systems are capable of producing very high quality YBCO superconducting films, but their deposition rates are too slow to be commercially viable; liquidsource MOCVD systems can be precisely controlled, but the solvents they require tend to kill superconducting oxides; and solid-source MOCVD systems suffer from imprecise process control, thermal degradation of precursor materials, or both. A simple and affordable MOCVD system, called ConBrio, is proposed as an alternative to existing deposition systems.

Department dc:contributor.department

Massachusetts Institute of Technology. Department of Mechanical Engineering

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

1996

Author dc:creator

• Hubert, Brian Norio

Advisor dc:contributor.advisor

• John Vander Sande.

• Mechanical Engineering

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/41025

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/41025