Applying run-by-run process control to chemical-mechanical planarization and assessing insertion costs versus benefits of CMP

Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1995, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

1995

Author dc:creator

• Altman, Arthur H

Advisor dc:contributor.advisor

• Duane Boning, Jeffrey A. Barks.

• Sloan School of Management
• Electrical Engineering and Computer Science

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/37766

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/37766