Magnetically levitated hysteresis motor driven linear stage for in-vacuum transportation tasks

This thesis presents a new in-vacuum reticle transportation mechanism for extreme ultraviolet (EUV) photolithography machines. In the photolithography process, the reticle is a quartz plate that contains a pattern of the integrated circuit, which needs to be transported between a storage position and the exposure stage. In next-generation EUV lithography machines, the reticle handling system must satisfy the following requirements: (1) transport the reticle through a distance of 2 meters, (2) the height of the mechanism needs to be within 100 mm, (3) operate in vacuum, and (4) satisfy ultra-tight contamination requirements. To fulfill these requirements, a conventional robotic reticle handler is inadequate. In this work, we designed, built, and tested a magnetically-levitated linear stage prototype, targeting at the reticle transportation application. Compared with robot manipulators, linear stages typically require less volume for long-distance transportation tasks.

Department dc:contributor.department

Massachusetts Institute of Technology. Department of Mechanical Engineering

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2019

Author dc:creator

• Zhou, Lei,Ph.D.Massachusetts Institute of Technology.

Advisor dc:contributor.advisor

• David L. Trumper.

• Mechanical Engineering.

Statement dc:rights

• MIT theses are protected by copyright. They may be viewed, downloaded, or printed from this source but further reproduction or distribution in any format is prohibited without written permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Repository record dc:identifier.uri

https://dspace.mit.edu/handle/1721.1/122142

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/122142