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Massachusetts Institute of Technology

Time dependent dielectric breakdown in novel GaN metal-insulator-semiconductor high electron mobility transistors

Abstract

dc:description.abstract

Power electronics is expanding as we automate and electrify our households and step into mainstream electric vehicles. Recently, GaN metal-insulator-semiconductor high electron mobility transistors (MIS-HEMTs) have been increasing in popularity for high voltage power electronics applications because they combine high electron mobility with low gate leakage, increasing efficiency. This comes with the tradeoff of increased reliability concerns to be addressed before the widespread commercialization of GaN MIS-HEMTs. This thesis investigates one failure mechanism found in prototype industrial GaN MIS-HEMTs: time dependent dielectric breakdown (TDDB) of the gate insulator. TDDB occurs when a high electric field causes an accumulation of defects in the gate dielectric, forming a conducting path and rendering the device unusable. This is of major concern in GaN MIS-HEMTs because of their role as switches in high voltage circuits. In this work, we develop testing methodologies to address reticle-to-reticle variations and we estimate the lifetime of novel GaN MIS-HEMTs by performing measurements at different stress levels and temperatures in the ON and OFF-states.

Degree

thesis:*
Name thesis:degree_name
Master
Department dc:contributor.department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2018

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Lednev, Alexander I.(Alexander Igorevich)
Advisor dc:contributor.advisor
  • Jesús A. del Alamo.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • MIT theses are protected by copyright. They may be viewed, downloaded, or printed from this source but further reproduction or distribution in any format is prohibited without written permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
https://hdl.handle.net/1721.1/121628
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/121628

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Lednev, Alexander I.(Alexander Igorevich). Time dependent dielectric breakdown in novel GaN metal-insulator-semiconductor high electron mobility transistors. Massachusetts Institute of Technology, 2018. https://hdl.handle.net/1721.1/121628