Light induced degradation in hydrogenated amorphous silicon (a-Si:H)

Light induced degradation in the microstructure and optical properties of a series of hydrogenated amorphous silicon (a-Si:H) layers, deposited by hot wire chemical vapour deposition system (HWCVD) on glass and silicon substrates at different temperatures ranging from 250Light induced degradation in the microstructure and optical properties of a series of hydrogenated amorphous silicon (a-Si:H) layers, deposited by hot wire chemical vapour deposition system (HWCVD) on glass and silicon substrates at different temperatures ranging from 250°C to 500°C are investigated. Light soaking experiments were carried out using a mirrored chamber with a metal halide lamp.

Grantor dc:publisher.institution

Department of Physics

Year dc:date.issued

2005

Author dc:creator

• Sigcau, Z

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/11427/6552

OAI identifier oai:identifier

oai:open.uct.ac.za:11427/6552