Changes in the near-surface stress in titanium caused by krypton ion-implantation

In this work, the effect of krypton implantation on the morphology of titanium samples is investigated through scanning electron microscopy (SEM). Rutherford backscattering spectrometry (RBS) was also used to determine the dose and depth of implanted krypton. The krypton profiile in titanium, and the associated damage profile, was modelled with TRIM calculations. In addition, metallurgical techniques were also used to examine the microstructure details of the as-received, unimplanted titanium sample.

Grantor dc:publisher.institution

Department of Physics

Year dc:date.issued

2006

Author dc:creator

• Tunde, Raji Abdulrafiu

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/11427/6515

OAI identifier oai:identifier

oai:open.uct.ac.za:11427/6515