Growth and characterisation of thin film superconductors on oxides, silicon and silicides

High Tc thin film superconductors are of great interest because of their potential applications, particularly in the microelectronics field. A successful superconductor microelectronic technology depends both on the ability to grow good quality superconducting thin films, and the need to incorporate these films into multilayer semiconductor devices. In this work the growth and characterisation of high Tc Y₁Ba₂Cu₃O₇ films by inverted cylindrical magnetron sputtering and pulsed ruby laser ablation on oxides, silicon and silicides is investigated. The inverted cylindrical magnetron sputter system has been effectively used to counter the problem of negative ion re-sputtering found in sputter deposition of oxide films. The optimal growth conditions for both these techniques have been determined. Rutherford backscattering spectrometry is used to obtain thickness and stoichiometry information, while X-ray diffraction gave phase and orientational data. Ion channeling was used for structural analysis and Auger electron spectroscopy was used to determine the homogeneity of the films.

Grantor dc:publisher.institution

Department of Physics

Year dc:date.issued

1994

Author dc:creator

• Naidoo, R Y

Advisors dc:contributor.advisor

• Pretorius, R
• Comrie, Craig M

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/11427/17519

OAI identifier oai:identifier

oai:open.uct.ac.za:11427/17519