{"id":{"repo_id":"cape-town","oai_identifier":"oai:open.uct.ac.za:11427/17519"},"canonical_url":"https://search.dev.ndltd.org/etd/cape-town/oai:open.uct.ac.za:11427/17519","repository":{"repo_id":"cape-town","name":"University of Cape Town","base_url":"https://open.uct.ac.za/oai/request"},"display":{"title":"Growth and characterisation of thin film superconductors on oxides, silicon and silicides","abstract":"High Tc thin film superconductors are of great interest because of their potential applications, particularly in the microelectronics field. A successful superconductor microelectronic technology depends both on the ability to grow good quality superconducting thin films, and the need to incorporate these films into multilayer semiconductor devices. In this work the growth and characterisation of high Tc Y₁Ba₂Cu₃O₇ films by inverted cylindrical magnetron sputtering and pulsed ruby laser ablation on oxides, silicon and silicides is investigated. The inverted cylindrical magnetron sputter system has been effectively used to counter the problem of negative ion re-sputtering found in sputter deposition of oxide films. The optimal growth conditions for both these techniques have been determined. Rutherford backscattering spectrometry is used to obtain thickness and stoichiometry information, while X-ray diffraction gave phase and orientational data. Ion channeling was used for structural analysis and Auger electron spectroscopy was used to determine the homogeneity of the films.","abstract_html":"High Tc thin film superconductors are of great interest because of their potential applications, particularly in the microelectronics field. A successful superconductor microelectronic technology depends both on the ability to grow good quality superconducting thin films, and the need to incorporate these films into multilayer semiconductor devices. In this work the growth and characterisation of high Tc Y₁Ba₂Cu₃O₇ films by inverted cylindrical magnetron sputtering and pulsed ruby laser ablation on oxides, silicon and silicides is investigated. The inverted cylindrical magnetron sputter system has been effectively used to counter the problem of negative ion re-sputtering found in sputter deposition of oxide films. The optimal growth conditions for both these techniques have been determined. Rutherford backscattering spectrometry is used to obtain thickness and stoichiometry information, while X-ray diffraction gave phase and orientational data. Ion channeling was used for structural analysis and Auger electron spectroscopy was used to determine the homogeneity of the films.","abstract_has_math":false,"creators":["Naidoo, R Y"],"institution":"Department of Physics","degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":null,"school":null,"contributors":[],"advisors":["Pretorius, R","Comrie, Craig M"],"committee_chairs":[],"committee_members":[],"year":1994,"date_issued":"1994","date_published":"1994","updated_at":"2026-07-22T22:22:46Z","subjects":[],"languages":["eng"],"rights":[],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/11427/17519","outbound_label":"Handle","outbound_source":"dc:identifier.uri"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor.advisor","label":"Advisor","values":["Pretorius, R","Comrie, Craig M"]},{"key":"dc:creator","label":"Author","values":["Naidoo, R Y"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date.accessioned","label":"Dc Date Accessioned","values":["2016-03-04T16:53:53Z"]},{"key":"dc:date.available","label":"Dc Date Available","values":["2016-03-04T16:53:53Z"]},{"key":"dc:date.issued","label":"Date","values":["1994"]},{"key":"dc:publisher.department","label":"Dc Publisher Department","values":["Department of Physics"]},{"key":"dc:publisher.institution","label":"Dc Publisher Institution","values":["University of Cape Town"]},{"key":"dc:type","label":"Dc Type","values":["Doctoral Thesis"]},{"key":"dc:type.qualificationlevel","label":"Dc Type Qualificationlevel","values":["Doctoral"]},{"key":"dc:type.qualificationname","label":"Dc Type Qualificationname","values":["PhD"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language.iso","label":"Language (ISO)","values":["eng"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier.uri","label":"Identifier URI","values":["http://hdl.handle.net/11427/17519"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Includes bibliographical references."]},{"key":"dc:description.abstract","label":"Abstract","values":["High Tc thin film superconductors are of great interest because of their potential applications, particularly in the microelectronics field. A successful superconductor microelectronic technology depends both on the ability to grow good quality superconducting thin films, and the need to incorporate these films into multilayer semiconductor devices. In this work the growth and characterisation of high Tc Y₁Ba₂Cu₃O₇ films by inverted cylindrical magnetron sputtering and pulsed ruby laser ablation on oxides, silicon and silicides is investigated. The inverted cylindrical magnetron sputter system has been effectively used to counter the problem of negative ion re-sputtering found in sputter deposition of oxide films. The optimal growth conditions for both these techniques have been determined. Rutherford backscattering spectrometry is used to obtain thickness and stoichiometry information, while X-ray diffraction gave phase and orientational data. Ion channeling was used for structural analysis and Auger electron spectroscopy was used to determine the homogeneity of the films."]},{"key":"dc:title","label":"Title","values":["Growth and characterisation of thin film superconductors on oxides, silicon and silicides"]}]}],"canonical_facts":{"dc:contributor.advisor":["Pretorius, R","Comrie, Craig M"],"dc:creator":["Naidoo, R Y"],"dc:date.accessioned":["2016-03-04T16:53:53Z"],"dc:date.available":["2016-03-04T16:53:53Z"],"dc:date.issued":["1994"],"dc:description":["Includes bibliographical references."],"dc:description.abstract":["High Tc thin film superconductors are of great interest because of their potential applications, particularly in the microelectronics field. A successful superconductor microelectronic technology depends both on the ability to grow good quality superconducting thin films, and the need to incorporate these films into multilayer semiconductor devices. In this work the growth and characterisation of high Tc Y₁Ba₂Cu₃O₇ films by inverted cylindrical magnetron sputtering and pulsed ruby laser ablation on oxides, silicon and silicides is investigated. The inverted cylindrical magnetron sputter system has been effectively used to counter the problem of negative ion re-sputtering found in sputter deposition of oxide films. The optimal growth conditions for both these techniques have been determined. Rutherford backscattering spectrometry is used to obtain thickness and stoichiometry information, while X-ray diffraction gave phase and orientational data. 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