Retention and reemission behaviour of Neon, Argon and Xenon on graphite exposed to TEXTOR 94 plasmas and ion beams

Kim, Young-Mo

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RWTH Aachen University

Retention and reemission behaviour of Neon, Argon and Xenon on graphite exposed to TEXTOR 94 plasmas and ion beams

dc:creator Kim, Young-Mo

dc:date1999

Author and committee

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Author dc:creator: Kim, Young-Mo
Contributors dc:contributor: Nickel, Hubertus

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Statement dc:rights: info:eu-repo/semantics/openAccess
Language dc:language: eng

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Identifier: https://publications.rwth-aachen.de/search?p=id:%22RWTH-CONV-117794%22
OAI record oai:identifier: https://publications.rwth-aachen.de/oai2d?verb=GetRecord&metadataPrefix=oai_dc&identifier=oai%3Apublications.rwth-aachen.de%3A55660

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Harvested from: RWTH Aachen University
Base URL: publications.rwth-aachen.de/oai2d
Last updated: 2026-07-30
Source record: OAI-PMH GetRecord

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aachen
1999

citation

Kim, Young-Mo. Retention and reemission behaviour of Neon, Argon and Xenon on graphite exposed to TEXTOR 94 plasmas and ion beams. 1999. https://publications.rwth-aachen.de/record/55660

Retention and reemission behaviour of Neon, Argon and Xenon on graphite exposed to TEXTOR 94 plasmas and ion beams

Author and committee

Rights

Identifiers

Chain of custody

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