Demagnifying X-ray lithography

In this thesis, a concept for a demagnifying lithography setup using hard x-rays is introduced. As demagnification tool, parabolic refractive x-ray lenses were used. In first experiments at the ESRF, magnifications between 2.8 and 4.1 were realized, but even larger values are possible with this setup. A commercial negative-tone electron-beam resist was used for the lithography. Monte Carlo simulations were used to investigate the influence of photoelectrons, Auger electrons and fluorescence photons on the shape of the resist edges. The exposure in an x-ray beam is actually due to photoelectrons which are generated in the resist and the substrate. The energy of the electrons and with it their range as well as the area, over which an exposed line smeares out, depend on the kind of the absorber. At high electron energies this area can be several micrometers wide. Since the absorption of hard x-rays in the resist itself is rather weak, the photoelectrons from the substrate are the main contribution to the exposure. Based on this simulation results, two design concepts for x-ray resists are proposed, were the incorporation of heavy atoms in the resist results in a higher absorbance of hard x-rays in the resist itself as well as a reduction of the linewidth due to the lower energies of the photoelectrons.

Grantor dc:publisher

Publikationsserver der RWTH Aachen University

Year dc:date

2003

Author dc:creator

• Zimprich, Christiane

Contributors dc:contributor

• Lengeler, Bruno

• info:eu-repo/classification/ddc/530
• Physik
• Lithographie
• Röntgen
• Synchrotron

Statement dc:rights

• info:eu-repo/semantics/openAccess

Language dc:language

eng

Identifier

https://publications.rwth-aachen.de/search?p=id:%22RWTH-CONV-114589%22

OAI record oai:identifier

https://publications.rwth-aachen.de/oai2d?verb=GetRecord&metadataPrefix=oai_dc&identifier=oai%3Apublications.rwth-aachen.de%3A52359