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Showing 1 to 20 of 478 for “"sputtering"”.

  1. Harmonic Sputtering Theory

    Zhang, Zhu Lin2010

    <p>ABSTRACT</p> <p>HARMONIC SPUTTERING THEORY</p> <p>By</p> <p>ZHU LIN ZHANG</p> <p>February 2010</p> <p>Advisor: Dr. Karur R. Padmanabhan</p> <p>Major: Physics</p> <p>Degree: Doctor of Philosophy</p> <p>Based on the standard Botzmann equation in Classical Statistics Mechanics, we have derived a …

    wayne-thes Repository record

  2. The physics of sputtering

    Stocker, B. J.Northern Polytechnic1962

    Early sputtering observations were made in the abnormal glow discharge at pressures around 1 mm Hg and indicated that the mass sputtered per unit charge passed through the discharge tube varied linearly with the cathode fall of potential.

    london-metro Repository record

  3. Novel components by magnetron sputtering

    Brookes, MG2005

    … advent of the closed field unbalanced magnetron sputtering (CFUBMS)technique has provided a novel method for the production of ultra thick (above50(jm) multilayer coatings, which form free standing foils when removed from thesubstrate. Applications for this method range from the production of …

    salford Repository record

  4. Comparison of high power impulse magnetron sputtering and modulated pulsed power sputtering for interconnect metallization

    Meng, LiangUniversity of Illinois at Urbana-Champaign2013

    … flux. In this work, high power impulse magnetron sputtering (HiPIMS) and its derivative, modulated pulsed power (MPP) magnetron sputtering, with their claimed high ionization capability, are proposed for the application of barrier/seed layer deposition. Their plasma properties and metal ionization …

    uiuc Repository record

  5. Measurement and Modeling of Lithium Sputtering

    Allain, Jean Paul2017

    Made available in DSpace on 2017-07-06T18:42:14Z (GMT). No. of bitstreams: 3 Allain_Jean_P_MS.pdf: 64643999 bytes, checksum: 3e4cb68dc37cbad16732e5531996e988 (MD5) Allain_Jean_P_MS_ABS.pdf: 500311 bytes, checksum: ca8ce22a3702cac7a9f32c228785e446 (MD5) license.txt: 4813 bytes, checksum: …

    uiuc Repository record

  6. Glow Discharge Optical Spectroscopy for Sputtering Diagnostics

    Sequeda Osorio, FedericoUniversity of Illinois at Urbana-Champaign2014

    Made available in DSpace on 2014-12-14T16:00:38Z (GMT). No. of bitstreams: 1 7821244.pdf: 6923671 bytes, checksum: 475e29fa7d2f2ca6284d17d4b17fe33a (MD5) Previous issue date: 1978

    uiuc Repository record

  7. Chemical sputtering studies of lithiated ATJ graphite

    Raman, PriyaUniversity of Illinois at Urbana-Champaign2013

    … system of lithiated ATJ graphite, chemical sputtering measurements of plain and lithiated ATJ graphite have been conducted in IIAX (Ion-surface InterAction eXperiment) facility. Chemical sputtering of graphite is dependent on the ion energy and substrate temperature, hence the total effects …

    uiuc Repository record

  8. Measurements and Modeling of Ti and TiN Sputtering

    Ranjan, Rajiv2017

    Made available in DSpace on 2017-07-06T18:56:01Z (GMT). No. of bitstreams: 3 Ranjan_Rajiv_MS.pdf: 1112075 bytes, checksum: 5abfc46cfff7d7a266b45252b6ac766b (MD5) Ranjan_Rajiv_MS_ABS.pdf: 8774 bytes, checksum: ae4f619491f3fe75dbdc9eeaf69df521 (MD5) license.txt: 4813 bytes, checksum: …

    uiuc Repository record

  9. Kinematic and Thermodynamic Effects on Liquid Lithium Sputtering

    Allain, Jean PaulUniversity of Illinois at Urbana-Champaign2015

    Results suggest that preferential sputtering of deuterium atoms over lithium atoms in D-treated samples significantly decrease the absolute sputtering yield of lithium by at least 60% in the case of He+ bombardment. The secondary sputtered ion fraction for lithium bombardment has been measured for …

    uiuc Repository record

  10. Low-Energy Ion-Induced Angularly-Resolved Sputtering Measurements

    Smith, Preston CraigUniversity of Illinois at Urbana-Champaign2015

    The phenomenon of ion-induced sputtering is integral to many applications. In magnetically confined fusion this sputtering is important for both the lifetime of plasma facing components as well as contamination of the plasma. In plasma processing the sputtering process is involved in etching …

    uiuc Repository record

  11. Argon Ion Sputtering of Niobium and Niobium Alloys

    Tortorelli, Peter FrancisUniversity of Illinois at Urbana-Champaign2014

    Made available in DSpace on 2014-12-14T16:00:38Z (GMT). No. of bitstreams: 1 7821063.pdf: 6678565 bytes, checksum: e83145c963afeb12ae16a83efdac2602 (MD5) Previous issue date: 1978

    uiuc Repository record

  12. An Investigation of Target Poisoning during Reactive Magnetron Sputtering

    Güttler, DominikTechnische Universität Dresden

    … Furthermore the EDF's obtained in reactive sputtering mode are broadened. Thus a superposition of two components, which correspond to the metallic and compound fractions of the surface, is assumed. The conclusion of this treatment is an discrete variation of surface binding energy during the …

    qucosa-diss

  13. Hollow cathode sputtering system - installation, operation and theoretical background

    Falk, Sebastian

    … assemble, install and operate a hollow cathode sputtering system (HCSS). Therefore a complex vacuum system was built to create the right sputtering environment. The purpose of the HCSS is to develop advanced thin conducting oxides (TCOs) as well as high resistivity transparent (HRT) layers which …

    njit Repository record

  14. Hydroxyapatite-based coatings deposited by radio frequency magnetron sputtering

    Ivanova, AnnaGhent University. Faculty of Sciences ; Tomsk Polytechnic University. Institute of Physics and Technology2017

    ghent Repository record

  15. Nanotermites multicamadas de Al/NiO sintetizadas por Magnetron Sputtering

    Santos, Tadeu Henrique dosUniversidade Federal do Rio de Janeiro2017

    … multilayer thin films, synthesized by magnetron sputtering of Al / NiO with different stoichiometries. Some compositions have shown released amount of heat of about 1.7 kJ /g, which is somewhat below the maximum achieved by similar compositions, which is around 2.44 kJ /g (YAN et al., 2015). The …

    brazil-uerj Repository record

  16. Magnetic field optimization for high power impulse magnetron sputtering

    Raman, PriyaUniversity of Illinois at Urbana-Champaign2016

    "High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) is a promising Physical Vapor Deposition technique with several advantages over DC Magnetron Sputtering (dcMS). HiPIMS has gained a lot of interest in the recent years from the coating industries. …

    uiuc Repository record

  17. The characterization of residual gases in a production sputtering system

    Quinn, Thomas Arthur

    sjsu Repository record

  18. Fabrication of smart glass electrochromic device using rf magnetron sputtering

    Abdullah, Siti AshrafUniversiti Tun Hussein Onn Malaysia2014

    … window glazing application by using RF magnetron sputtering. The oxygen flow rate for the deposition is varied from 10sccm -22sccm which is 25%, 27%, 30%, and 35% of oxygen flow. The structures of WO3 were investigated using X-Ray diffraction, Field effect scanning electron microscopy (Fe-Sem) and …

    uthm Repository record

  19. Structure Evolution of Biaxially Aligned Thin Films Deposited by Sputtering

    Ghekiere, Pieter2007

    … on an inclined substrate by unbalanced magnetron sputtering. Biaxially aligned thin films are polycrystalline thin films whereby the crystallographic orientation of the grains is aligned along two axes, i.e. perpendicular (out-of-plane) and parallel (in-plane) to the substrate. In the limit, all …

    ghent Repository record

  20. Thermal Evaporation and Sputtering Studies of Lithium and Lithiated Graphite

    Ibano, Kenzo S.2017

    Made available in DSpace on 2017-07-06T18:48:44Z (GMT). No. of bitstreams: 2 Ibano_Kenzo_S_MS.pdf: 12873949 bytes, checksum: 7415d59e55113ba2e6e0368fac5636f3 (MD5) license.txt: 4813 bytes, checksum: 715c4321821a960fa1a1e91d2ac7ebce (MD5) Previous issue date: 2009

    uiuc Repository record

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