Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 20 of 142 for “"atomic layer deposition"”.
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Electroless Atomic Layer Deposition
… surface. This poses an issue when very thin film deposition is required with 2D morphology and full coverage of deposit is desired. In this thesis, we propose a protocol for aqueous solution based thin film deposition where deposit thickness is precisely controlled down to a monolayer. We …
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Atomic layer deposition of photovoltaics
… and scalability have remained major challenges. Atomic layer deposition (ALD) is a low processing temperature technique capable of providing unrivalled thin-film conformality with uniform sub-nanometre thickness on large scale areas. Its use in depositing thin charge selective contacts as well as …
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Multi-scale modelling of atomic layer deposition
… and show the desired properties as a thin film. Atomic layer deposition (ALD) is used practically to deposit high-k materials like HfO2, ZrO2, and Al2O3 as gate oxides. ALD is a technique for producing conformal layers of material with nanometer-scale thickness, used commercially in non-planar …
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SURFACE SCIENCE APPROACH TO ATOMIC LAYER DEPOSITION CHEMISTRY
Recently, atomic layer deposition (ALD) has been employed as a promising technique for the growth of solid thin films with high conformality on complex geometries such as heterogeneous catalysts and microelectronic devices. In this work, surface sensitive characterization techniques have been …
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Atomic layer deposition for mechanical, magnetic, and robotic systems
… thickness on the scale of nanometers. We employ atomic layer deposition to synthesize films as thin as 2 nm and employ these films to create mechanical metamaterials, self-folding machines, and magnetic microbots. We begin this endeavor by developing fabrication methods to produce free-standing …
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Atomic layer deposition of metal oxides for photovoltaic applications
… process of the cell to ensure that all layers are deposited using a low-energy process at low temperatures to prevent the degradation of the underlying layers. The changes in the fabrication processes must also not affect the electrical, optical and morphological properties of the …
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Dielectric materials by Atomic Layer Deposition for microelectronic applications
The Atomic Layer Deposition (ALD) is an innovative technique to deposit thin film materials for several application fields. The rapid affirmation of the ALD process is related to the peculiarities of the deposition mechanism. In particular, because of the self-limiting principle and of the …
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Ab initio determination of kinetics for atomic layer deposition modeling
… model is developed to describe the kinetics of atomic layer deposition (ALD) systems. This model requires no fitting parameters, as it is based on the reaction pathways, structures, and energetics obtained from quantum-chemical studies. Using transition state theory and partition functions from …
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Numerical simulation of a single wafer atomic layer deposition process
Atomic Layer Deposition (ALD) is a process used to deposit nanometer scale films for use in nano electronics. A typical experimental reactor consist of a warm wall horizontal flow tube, a single disc mounted halfway down the tube, and an alternating cycle flow between a reactant gas and a wash in a …
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FUNCTIONAL THIN FILMS BY SPATIAL ATOMIC LAYER DEPOSITION FOR PHOTOVOLTAIC APPLICATIONS
… and analysis of thin films deposited by spatial atomic layer deposition for application in the photovoltaic industry. The atomic layer deposition technique offers good uniformity, conformality and precise film thickness control. The spatial atomic layer deposition technique combines a high …
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ENGINEERING NI/AL2O3 CATALYSTS BY ATOMIC LAYER DEPOSITION FOR METHANE REFORMING
… on Ni/Al<sub>2</sub>O<sub>3</sub> prepared by atomic layer deposition (ALD) and ALD-prepared ultrathin overcoating (e.g., ZrO<sub>2</sub> and CeO<sub>x</sub>) on Ni/Al<sub>2</sub>O<sub>3</sub> prepared by incipient wetness method were investigated for methane reforming.</p> <p>MgO and …
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Defect engineering of polycrystalline titanium dioxide synthesized by atomic layer deposition
There is good reason to believe that the properties of semiconducting metal oxides for catalytic and integrated circuit applications can be improved when designed according to the principles of microelectronic devices. Defect engineering is used extensively in the semiconductor processing industry …
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Microplasma-driven, atomic layer deposition of flexible electronic and photonic nanofilms
Atomic Layer Deposition (ALD) of aluminum oxide (Al2O3), gallium oxide (Ga2O3) and Zirconium oxide (ZrO2), driven by arrays of microcavity plasmas (MALD), has been demonstrated. Microplasma has been drawn attention due to its unique characteristics such as high electron density (>1016 cm-3), low …
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Atomic Layer Deposition of Vanadium Dioxide: Synthesis, Doping, and Device Applications
… that aims to synthesize VO₂ thin films by atomic layer deposition (ALD), to dope VO₂ films with germanium (Ge) by ALD, and to demonstrate the device applications of ALD VO₂ films. The VO₂ thin films have been deposited onto amorphous substrates by a process of multiple pulsing ALD. A …
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On the 1/f noise of atomic-layer-deposition metal films
… and results of low-frequency noise for atomic-layer-deposition Pt films. Atomic-layer-deposition has been developed as an approach to make ultra-thin and conformal films. It has been employed to make detectors of bolometers. 1/f noise is a fundamental limit to the resolution. The …
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Surface reaction mechanisms during the atomic layer deposition of silicon-based dielectrics
… (≤400 °C) highly-conformal (>95%) atomic layer deposition (ALD) of Si-based dielectric films for applications such as sidewall spacers in multiple patterning. In this work, we have primarily focused on understanding the surface reaction mechanisms during the ALD of Si-based …
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Dielettrici high-κ Al-based per 4H-SiC tramite Atomic Layer Deposition
… su 4H-SiC tramite thermal e plasma enhanced-Atomic Layer Deposition (ALD). In particolare, è stata studiata la deposizione di ossido di alluminio (Al2O3), nitruro di alluminio (AlN), le loro combinazioni in stack e mixing nanometrici di Al2O3/HfO2. Le caratterizzazioni strutturali e chimiche …
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