Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 20 of 132 for “"Removal rate"”.
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Face-up chemical mechanical polishing : kinematics and material removal rate
A working prototype face-up CMP tool has successfully been completed. Experiments conducted on the face-up CMP machine qualitatively correspond with the theoretical polishing model. Discrepancies in data from the theoretical model could potentially be caused by non-uniform loading of the polishing …
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Influence of Solvent Removal Rate and Polymer Concentration on Ordering Kinetics of Block Copolymers in Solution
… was also developed for studying different drying rates of these films at a constant temperature. Temperature quenches of poly(styrene-b-isoprene-b-styrene) were performed to evaluate the effect of concentration on ordering rate. In all cases studied, an ordering layer was observed where …
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Optimization of Nitrogen Removal Rate in One-Stage Reactor through Partial Nitrification Anammox Process during Direct Treatment of Poultry Litter Wastewater
… this project is aimed at optimizing the nitrogen removal rate through partial nitrification anammox process (PN/A) to treat synthetic poultry litter wastewater. Nitrogen removal efficiencies will therefore be improved through optimizing the combination of three operating parameters including …
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G-Code Based Toolpath Simulation for Predicting CNC Energy Consumption
… accessible to CNC machining, where the material removal rate is variable. This thesis develops a G-code based simulation that uses a voxel mesh to virtually recreate material removal, approximating the material removal rate at discretized points in the machining process. Using an energy …
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Study of the Effect of BiOWiSH Aqua on Simultaneous Nitrification and Denitrification in a Membrane Aerated Bioreactor
… for the remainder of this paper, on the nitrogen removal rate in a membrane aerated bioreactor (MABR). This research was conducted using a MABR design that consisted of a silicone membrane and continuous flow airline with compressed air. The membrane system was designed to supply oxygen, creating …
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Copper Surface Chemistry Relevant to Chemical Mechanical Planarization (Cmp)
… benzotriazole and 1,2,4-triazole (TAZ) on copper removal rate during CMP. Removal rates were higher for solutions containing TAZ than solutions containing BTA. The corrosion inhibitor films were characterized using AFM, cyclic voltammetry, impedance spectroscopy, surface-enhanced Raman …
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Design of a microbreather for two-phase microchannel devices
… surface chemistry and microstructures to separate gas from a liquid flow to improve two-phase microchannel performance. To better understand the physics and governing parameters of the proposed breather, we have designed and fabricated test devices that allow cross-sectional visualization of …
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Multi-scale models for wafer surface evolution in chemical mechanical planarization
… structure variation across a chip. The material removal rates are different for the regions with different pattern structure. Therefore, CMP obtains local planarization but generates global thickness variation. Two models, referred as Models I and II, are developed to investigate the pattern …
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Vibration assisted machining: Modelling, simulation, optimization, control and applications
… as vibration frequency, vibration amplitude, feedrate and spindle speed while taking into account machine dynamics effect and the outcomes such as surface roughness generated, tool wear and material removal rate in the process. The machine dynamics has been investigated including a static …
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Surface texture enhancement of SLS processed turbine blades using a mix of flexible media and abrasives
… of the flexible media can increase the material removal rate of process by up to 200% due to a vibratory motion that was observed of the abrasive particle. These results are promising in showing that the proposed abrasive flow polishing technology can improve the material removal rate of the …
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Rotary ultrasonic machining of ceramics: Characterization and extensions
… which are capable of achieving high material removal rate while maintaining the surface/subsurface damage to the machined parts at an acceptable level. Rotary Ultrasonic Machining (RUM), a hybrid machining process combining the material removal mechanisms of diamond grinding and ultrasonic …
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Control of wafer-scale non-uniformity in chemical-mechanical planarization by face-up polishing
… in the manufacture of ultra-large-scale-integrated (ULSI) semiconductor devices. A major concern in CMP is non-uniform planarization, or polishing, at the wafer-scale - primarily as interconnect metal dishing and dielectric erosion. In conventional face-down CMP, the pad is much larger than …
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The mechanics of power hacksawing and the cutting action of blunt tools
… <p>Process parameters which influence the metal. removal rate during power hacksawing have been identified and thus a detailed explanation of the basic sawing mechanism-suggested. Power hacksaw machine characteristics have also been investigated.</p> <p>The problem of blade testing is discussed. A …
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Gibbsian Segregating Alloys Driven by Thermal and Concentration Gradients: A Potential Grazing Collector Optics Used in EUV Lithography
… and surface concentration gradient (surface removal flux), are the focus of this work. Both theoretical and experimental efforts have been performed to prove the effectiveness of the GS alloy used as EUV collection optics, and to elucidate the underlying physics behind it. The segregation …
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Influence of vegetation on sediment bacterial community structure, microbial enzyme activities and phosphorus retention in constructed freshwater wetlands
… enzymes. </p> <p>To study phosphorus retention rates, mesocosms in the greenhouse were dosed with 2.5 mg/L of phosphorus for six months in 2008 and 2009. This was folloby a decomposition experiment to study the release of phosphorus due to plant senescence. The net removal rate was highest for …
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Micro-scale scratching by soft pad asperities in chemical-mechanical polishing
In the manufacture of integrated circuits (IC) and micro-electromechanical systems (MEMS), chemical-mechanical polishing (CMP) is widely used for providing local and global planarization. In the CMP process, polishing pads, typically made of polyurethanes, play a key role. Due to the random, rough …
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The development of process kinetics for a waste treatment system utilizing filamentous microorganisms
… to determine the effects of parameters like flow rate, support media area, organic loading, pH, and the BOD-to-nitrogen ratio. Findings of the study indicated that the removal rate, suspended solids concentration in the effluent, and percent COD remaining in the final growth cell of the growth …
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Surface Chemistry Of Application Specific Pads And Copper Chemical Mechanical Planarization
… role in the continued improvement of the integrated circuit (IC) density, performance and cost. Copper (Cu) metallization, dual damascenes processing and integration of copper with low dielectric constant material are key issues in the IC industries. Chemical mechanical planarization of copper …
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A study of substrate removal in a microbial film reactor
… is formulated describing the mechanism of substrate removal by a microbial slime over which a film of liquid, containing the substrate as dissolved biodegradable material, is flowing. It is assumed that a lack of either organic carbon, oxygen, or both simultaneously, can limit the overall rate …
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