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Showing 1 to 20 of 29 for “"InGaAsP"”.

  1. Femtosecond nonlinearities in InGaAsP diode lasers

    Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1993.

    mit Repository record for Femtosecond nonlinearities in InGaAsP diode lasers (opens in a new tab)

  2. Wavelength conversion by four wave mixing in passive InGaAsP/InP waveguides

    Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1996.

    mit Repository record for Wavelength conversion by four wave mixing in passive InGaAsP/InP waveguides (opens in a new tab)

  3. The integration of InP /InGaAsP ridge waveguide structures with dielectric waveguides on silicon

    … vapor deposition (PECVD). The integrated InP/InGaAsP structures were fabricated using an existing novel technique for preparing very thin (on the order of 5 pm thick) substrate free rectangular structures (approximately 145 pm wide by 300 pm long) with cleaved facets. Using a pick-and-place …

    mit Repository record for The integration of InP /InGaAsP ridge waveguide structures with dielectric waveguides on silicon (opens in a new tab)

  4. Femtosecond gain-index coupling in femtosecond nonlinearity measurements of InGaAsP diode laser amplifiers

    Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.

    mit Repository record for Femtosecond gain-index coupling in femtosecond nonlinearity measurements of InGaAsP diode laser amplifiers (opens in a new tab)

  5. Développement d'un procédé de gravure plasma pour la fabrication de composants photoniques à base d'hétérostructures InP/InGaAsP

    Le but du projet est de développer un procédé de gravure stable et bien intégré dans le processus complet de fabrication de dispositifs photoniques à base d'InP. Le présent document expose le résultat de différents procédés de gravure sur échantillons à base d'InP. La préparation des échantillons …

    sherbrooke Repository record for Développement d'un procédé de gravure plasma pour la fabrication de composants photoniques à base d'hétérostructures InP/InGaAsP (opens in a new tab)

  6. The Characterization of Liquid Phase Epitaxial Indium-Gallium - Arsenide - Phosphide and Indium-Gallium - Arsenide

    The growth of InGaAsP and InGaAs by liquid phase epitaxy (LPE) on InP substrates has been investigated to obtain the optimum crystal growth parameters to produce high quality epitaxial layers. The lattice mismatch of these layers with respect to the underlying InP substrate was determined by X-ray …

    uiuc Repository record for The Characterization of Liquid Phase Epitaxial Indium-Gallium - Arsenide - Phosphide and Indium-Gallium - Arsenide (opens in a new tab)

  7. Liquid Phase Epitaxial Indium-Gallium-Arsenide - Phosphide Avalanche Photodiodes for Near-Infrared Detection

    The fabrication and characterization of InGaAsP/InP avalanche photodiodes for near-infrared detection is described in detail. Particular material requirements which must be satisfied for these devices are considered and the special techniques involved in the use of liquid phase epitaxy which have …

    uiuc Repository record for Liquid Phase Epitaxial Indium-Gallium-Arsenide - Phosphide Avalanche Photodiodes for Near-Infrared Detection (opens in a new tab)

  8. Metal-assisted chemical etching of III-V semiconductors for advanced optoelectronic device fabrication

    … and photonics. However, MacEtch of InGaAsP, an important quaternary semiconductor for long wavelength communications, is yet to be reported. This thesis demonstrates the fabrication of InGaAsP gratings for distributed feedback (DFB) lasers by MacEtch as well as antireflection …

    uiuc Repository record for Metal-assisted chemical etching of III-V semiconductors for advanced optoelectronic device fabrication (opens in a new tab)

  9. Vapor Phase Epitaxial Growth of Gallium Arsenide, Indium Phosphide, and Indium Gallium Arsenide by the Hydride Technique

    The use of InGaAsP alloys for optical fiber communication systems is discussed. The advantages and various types of vapor phase epitaxial growth systems are examined before looking at the open tube growth process in detail. Using the criteria for high purity systems, which are thoroughly reviewed, …

    uiuc Repository record for Vapor Phase Epitaxial Growth of Gallium Arsenide, Indium Phosphide, and Indium Gallium Arsenide by the Hydride Technique (opens in a new tab)

  10. Liquid phase epitaxial growth and heterointerface characteristics of long-wavelength indium gallium arsenide phosphide heterostructures

    "Data are presented that demonstrate that the InGaAsP quaternary grown by constant temperature liquid phase epitaxy on InP substrate can, under certain growth conditions, exhibit considerably narrower diffraction profile half-widths than previously reported. The double crystal x-ray diffraction …

    uiuc Repository record for Liquid phase epitaxial growth and heterointerface characteristics of long-wavelength indium gallium arsenide phosphide heterostructures (opens in a new tab)

  11. Characterization of reactive ion etching of III-V compound semiconductor materials

    … materials such as InP, InGaAs, InAlAs, and InGaAsP in methane (CH$\sb4$) gas mixtures has been investigated. Etch rates of 800, 400 and 600 A are obtained for InP, InGaAs, and InGaAsP, respectively. Optimum processes have been developed for reliable fabrication of uniform short period …

    uiuc Repository record for Characterization of reactive ion etching of III-V compound semiconductor materials (opens in a new tab)

  12. High-purity epitaxial growth and characterization of III-V compound semiconductors

    … better assess the crystalline homogeneity of the InGaAsP alloy system.

    uiuc Repository record for High-purity epitaxial growth and characterization of III-V compound semiconductors (opens in a new tab)

  13. Nonlinear Optics in III-V Quaternary Semiconductor Waveguides

    … on quaternary III-V semiconductors AlGaAsSb and InGaAsP. We present modal analysis for waveguide designs and show that effective mode area much less than 1 $\mu m^{2}$ can be obtained. We also report specific waveguide designs that display zero-dispersion points at the specific wavelength ranges …

    ottawa-retro Repository record for Nonlinear Optics in III-V Quaternary Semiconductor Waveguides (opens in a new tab)

  14. Solution Kinetics and Impact Ionization in the Indium-Gallium - Arsenide Phosphide Alloy System (Crystal Growth, Photodetectors)

    … device fabrication, and device physics in the InGaAsP/InP material system. It is divided into three sections. Chapter I is a detailed account of the liquid phase epitaxial (LPE) crystal growth of In(,1-x)Ga(,x)As(,y)P(,1-y) layers lattice-matched to InP substrates. It covers many aspects of the …

    uiuc Repository record for Solution Kinetics and Impact Ionization in the Indium-Gallium - Arsenide Phosphide Alloy System (Crystal Growth, Photodetectors) (opens in a new tab)

  15. Study of Type-I and Type-Ii Strained Quantum -Well Lasers

    … studied. For a type-I QW structure, the 1.55-pm InGaAsP and InGaAlAs QW lasers are investigated both in the steady-state and high-speed modulation schemes. We show excellent agreement of our experimental data with the results of our theoretical gain model with many-body effects. The …

    uiuc Repository record for Study of Type-I and Type-Ii Strained Quantum -Well Lasers (opens in a new tab)

  16. High fidelity pattern transfer in InP photonic device fabrication

    … techniques. The Faraday rotator is a 1.4 Jim InP-InGaAsP-InP waveguide with a line width tolerance of ± 0.07 pm.

    mit Repository record for High fidelity pattern transfer in InP photonic device fabrication (opens in a new tab)

  17. Développement d'un procédé pour la réalisation de diodes laser stabilisées en fréquence sans reprise d'épitaxie

    … L'hétérostructure utilisée est du InGaAs/InGaAsP/InP. Le procédé de fabrication consiste en premier lieu de lithographie par faisceau d'électrons, de photolithographie et finalement de gravure plasma. Le masque de gravure est fait d'un agencement d'oxyde de silicium et de chrome, soient …

    sherbrooke Repository record for Développement d'un procédé pour la réalisation de diodes laser stabilisées en fréquence sans reprise d'épitaxie (opens in a new tab)

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