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Showing 1 to 20 of 38 for “"DC magnetron"”.

  1. Reactive DC magnetron sputtering of ultrathin superconducting niobium nitride films

    Dane, Andrew E. (Andrew Edward)Massachusetts Institute of Technology2015

    DC reactive magnetron sputtering was used to deposit few-nanometer-thick films of niobium nitride for fabrication of superconducting devices. Over 1000 samples were deposited on a variety of substrates, under various chamber conditions. Sheet resistance, thickness and superconducting critical …

    mit Repository record

  2. Electrical characterization and application of pulsed DC magnetron sputtered zirconium oxide

    Leathem, Michael R.

    rit Repository record

  3. DC magnetron reactive sputtering of low stress AlN piezoelectric thin films for MEMS application

    Hsieh, Peter Y. (Peter Yaw-ming), 1975-Massachusetts Institute of Technology1999

    Microelectromechanical systems (MEMS) often incorporate piezoelectric thin films to actuate and detect motion of mechanical structures. Aluminum nitride is advantageous for MEMS use because it can be deposited at low temperatures, is easily patterned using conventional photolithographic techniques, …

    mit Repository record

  4. Growth, properties and electronic stability of DC magnetron reactive sputtered hydrogenated amorphous silicon thin films

    Pinarbasi, MustafaUniversity of Illinois at Urbana-Champaign2011

    Restriction data tranferred 2014-07-01T11:15:22-05:00 Original Data Group with Access UIUC Users [automated] Release Date: none Reason: ETDs are only available to UIUC Users without author permission

    uiuc Repository record

  5. Characterization of the growth flux during the deposition of hydrogenated amorphous silicon by DC magnetron reactive sputtering

    Myers, Alan MarkUniversity of Illinois at Urbana-Champaign2011

    Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by Howard Ding (hding2@illinois.edu) on 2011-05-07T15:06:59Z Item is restricted indefinitely.

    uiuc Repository record

  6. Reduced density hydrogenated silicon through reactive dc magnetron sputtering with secondary rf plasma discharge for EUV multilayer mirror application

    Uhlig, Jan PeterUniversity of Illinois at Urbana-Champaign2019

    Made available in DSpace on 2019-11-26T20:49:30Z (GMT). No. of bitstreams: 2 UHLIG-THESIS-2019.pdf: 3040065 bytes, checksum: 4444cd75305422a711eb398f1ec5e75c (MD5) LICENSE.txt: 4206 bytes, checksum: 5a9d596ce58190a77714e399a794eb23 (MD5) Previous issue date: 2019-07-18

    uiuc Repository record

  7. Investigation of opto-electronical properties of DC magnetron sputtered ZnO:Al films with respect to the layer thickness, annealing temperature and resistance inhomogeneity

    Nowak, Regina-ElisabethUniversität Oldenburg

    Investigation of opto-electronical properties of DC magnetron sputtered ZnO:Al films with respect to the layer thickness, annealing temperature and resistance inhomogeneity

    oldenburg Repository record

  8. Determination of Ionization Fraction and Plasma Potential in a DC Magnetron Sputtering System Using a Quartz Crystal Microbalance and a Gridded Energy Analyzer

    Green, Karyn M.2017

    Made available in DSpace on 2017-07-06T18:48:17Z (GMT). No. of bitstreams: 3 Green_Karyn_M_MS.pdf: 35887684 bytes, checksum: 4d8ec8bef5ab4e9e6aabee4e3ff410a5 (MD5) Green_Karyn_M_MS_ABS.pdf: 507343 bytes, checksum: 0d504c63e61c048bbb16c0ee4bce83fa (MD5) license.txt: 4813 bytes, checksum: …

    uiuc Repository record

  9. Deposition and characterization of magnetron sputtered BCC tantalum

    Patel, Anamika

    … (Ta) coatings on steel substrates deposited by DC magnetron sputtering. Deposition of tantalum on steel is of special interest for the protection it offers to surfaces, e.g. the surfaces of gun barrels against the erosive wear of hot propellant gases and the mechanical damage caused by the …

    njit Repository record

  10. Nanoindentation of Annealed and As-Sputtered Thin Films of Nickel Titanium Shape Memory Alloys

    Lewis, Matthew Tyson2010

    … focus on the fabrication of thin film NiTi by DC magnetron sputtering deposition and testing mechanical properties of the fabricated films by nanoindentation. Thin film NiTi SMA was successfully created by DC magnetron sputtering deposition and high vacuum annealing in the Microfabrication …

    calpoly Repository record

  11. Reactive magnetron deposition and characterization of ZrN thin films for decorative and field emission applications

    Nyawo, Thembinkosi GoodmanUniversity of Zululand2012

    … Aluminium strip, brass strips and glass, by DC magnetron sputtering system under varying conditions of power, pressure, argon and nitrogen gas flow rates as well as temperature, and were characterized by SEM/EDX, AFM, Colour photospectrometer, RBS and resonant RBS. The films were found to be …

    zulu Repository record

  12. Fabrication of metallic nanostructures from sputtered nanocluster precursors

    DelHagen, William SMassachusetts Institute of Technology2004

    … of copper nanocluster devices generated by DC magnetron sputtering and annealed at temperatures up to 1100 C. At each annealing step, the resistivity of the cluster device was measured and electron micrographs were taken of the cluster depositions. Nanoclusters have been studied for decades …

    mit Repository record

  13. Diagnostics for ionized physical vapor deposition chambers

    Wu, YuilunUniversity of Illinois at Urbana-Champaign2016

    … from simulation results the ion flux from a magnetron discharge has a narrow angular distribution and this distribution is becoming more significant as the aspect ratio increases. In order to confirm and adjust this predicted distribution a sensor to measure angular distribution of ions in an …

    uiuc Repository record

  14. Planar tunneling spectroscopy of thin-film Nb, Nb/normal metal and Nb/semiconductor structures

    Abeyta, Adam Christopher2012

    … dependence study was performed on high-quality, DC-magnetron sputter deposited Nb on single-crystal sapphire. The DC resistivity was measured as a function of ternperature to evaluate the film quality and determine Tc. The critical temperature was found to monotonically decrease with decreasing …

    uiuc Repository record

  15. Aging Effect in the Wettability of Nickel Nanorod Arrays

    Albarakati, Nahla2021

    … arrays were deposited on silicon substrates by DC magnetron sputtering using an oblique angle of 85° with respect to the substrate normal. By changing the deposition time from 10 to 90 min., the diameter, height, and separation of the nanorods were varied. The water contact angles of each sample …

    vcu Repository record

  16. Magnetic field optimization for high power impulse magnetron sputtering

    Raman, PriyaUniversity of Illinois at Urbana-Champaign2016

    "High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) is a promising Physical Vapor Deposition technique with several advantages over DC Magnetron Sputtering (dcMS). HiPIMS has gained a lot of interest in the recent years from the coating industries. …

    uiuc Repository record

  17. Spin transport through nanopillar superconducting spin valves

    Stoddart-Stones, BenUniversity of Cambridge2021

    … 200 nm Cu contact layers were deposited using dc magnetron sputtering, and fabricated into current-perpendicular-to-plane (CPP) nanopillars using optical lithography and Ar ion milling followed by focused ion beam milling. Magnetic and electrical characterisation of these devices at …

    cambridge Repository record

  18. Preparation and characterisation of inorganic nanostructured support materials for polymer electrolyte fuel cells

    September, Caelin GeeDepartment of Chemical Engineering2015

    … crushed nanofibers and nanofiber mats via DC magnetron sputter deposition and thermally induced chemical deposition (TICD). The synthesised catalysts were physically characterised using X-ray diffraction (XRD), Transmission Electron Microscopy (TEM), Scanning Electron Microscopy (SEM) and …

    cape-town Repository record

  19. Fabrication and characterization of multilayers for focusing hard x-ray optics

    Ivan, Adrian, 1964-Massachusetts Institute of Technology2002

    … time employing a consistent methodology for the DC magnetron sputtering growth of the multilayers and their characterization by x-ray reflectivity (XRR) measurements. The width of the interfaces was identified as the most important factor that must be controlled and minimized to achieve high …

    mit Repository record

  20. Radio frequency miniature passive devices: ferrite antennas and inductors

    Lee, JaejinUniversity of Alabama Libraries2015

    … are presented with a small direct current (DC) magnetic field, therefore, antenna miniaturization and gain improvement are achieved. A high-isolation multi-input multi-output (MIMO) antenna array design is demonstrated with miniature ferrite antenna elements for long-term evolution (LTE) …

    alabama Repository record

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