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Massachusetts Institute of Technology

Sputtering fabrication of silicon nitride and silicon oxide based dichroic mirrors

Abstract

dc:description.abstract

Thin films in optical materials utilize the properties of multiple materials to obtain specific and fine-tuned transmission, absorption and reflectance at wavelengths. Dichroic mirrors exhibit very different reflectance and transmission rates at certain cut-off wavelengths, which can be adjusted using changes in layer materials and thickness. This is due to constructive optical interference between alternating layers of two thin films of different refractive indices. This study explored the sputtering methods of thin-film multilayers to form dichroic mirrors in the visible spectrum for future solar-cell applications. Silicon oxide and silicon nitride targets were selected as materials used in the sputtering process. The sputtered multilayers and films were then characterized and analyzed using spectrophotometry. The transmission spectrum of the initial multilayer depicted failure in transmission at wavelengths under 500nm. The components of the multilayer were then sputtered and analyzed to troubleshoot the problematic nitride films. Transmission spectra were utilized to select each following process, and both reactive sputtering and cosputtering were explored as means of creating nitride films with functional properties. Transmission spectra were analyzed using the Swanepoel method to quantify optical characteristics to assure reactive sputtering of the targets in a nitrogen environment as a viable direction of mirror construction. Possible further work include the use of other targets such as titanium oxide, and different chamber gas mixtures for finer control in the composition of the film layers.

Degree

thesis:*
Department dc:contributor.department
Massachusetts Institute of Technology. Department of Materials Science and Engineering.
Grantor dc:publisher
Massachusetts Institute of Technology
Year dc:date.issued
2015

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Bae, Dohyun
Advisor dc:contributor.advisor
  • Jurgen Michel.

Subjects

dc:subject × 1

Rights

dc:rights
Statement dc:rights
  • M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Language dc:language.iso
eng

Identifiers

dc:identifier.*
Handle dc:identifier.uri
http://hdl.handle.net/1721.1/98645
OAI identifier oai:identifier
oai:dspace.mit.edu:1721.1/98645

Chain of custody

source
Harvested from
MIT
Base URL
dspace.mit.edu/oai/request
Last updated
2026-07-22
Source record
OAI-PMH GetRecord
citation

Bae, Dohyun. Sputtering fabrication of silicon nitride and silicon oxide based dichroic mirrors. Massachusetts Institute of Technology, 2015. http://hdl.handle.net/1721.1/98645