{"id":{"repo_id":"mit","oai_identifier":"oai:dspace.mit.edu:1721.1/98645"},"canonical_url":"https://search.dev.ndltd.org/etd/mit/oai:dspace.mit.edu:1721.1/98645","repository":{"repo_id":"mit","name":"MIT","base_url":"https://dspace.mit.edu/oai/request"},"display":{"title":"Sputtering fabrication of silicon nitride and silicon oxide based dichroic mirrors","abstract":"Thin films in optical materials utilize the properties of multiple materials to obtain specific and fine-tuned transmission, absorption and reflectance at wavelengths. Dichroic mirrors exhibit very different reflectance and transmission rates at certain cut-off wavelengths, which can be adjusted using changes in layer materials and thickness. This is due to constructive optical interference between alternating layers of two thin films of different refractive indices. This study explored the sputtering methods of thin-film multilayers to form dichroic mirrors in the visible spectrum for future solar-cell applications. Silicon oxide and silicon nitride targets were selected as materials used in the sputtering process. The sputtered multilayers and films were then characterized and analyzed using spectrophotometry. The transmission spectrum of the initial multilayer depicted failure in transmission at wavelengths under 500nm. The components of the multilayer were then sputtered and analyzed to troubleshoot the problematic nitride films. Transmission spectra were utilized to select each following process, and both reactive sputtering and cosputtering were explored as means of creating nitride films with functional properties. Transmission spectra were analyzed using the Swanepoel method to quantify optical characteristics to assure reactive sputtering of the targets in a nitrogen environment as a viable direction of mirror construction. Possible further work include the use of other targets such as titanium oxide, and different chamber gas mixtures for finer control in the composition of the film layers.","abstract_html":"Thin films in optical materials utilize the properties of multiple materials to obtain specific and fine-tuned transmission, absorption and reflectance at wavelengths. Dichroic mirrors exhibit very different reflectance and transmission rates at certain cut-off wavelengths, which can be adjusted using changes in layer materials and thickness. This is due to constructive optical interference between alternating layers of two thin films of different refractive indices. This study explored the sputtering methods of thin-film multilayers to form dichroic mirrors in the visible spectrum for future solar-cell applications. Silicon oxide and silicon nitride targets were selected as materials used in the sputtering process. The sputtered multilayers and films were then characterized and analyzed using spectrophotometry. The transmission spectrum of the initial multilayer depicted failure in transmission at wavelengths under 500nm. The components of the multilayer were then sputtered and analyzed to troubleshoot the problematic nitride films. Transmission spectra were utilized to select each following process, and both reactive sputtering and cosputtering were explored as means of creating nitride films with functional properties. Transmission spectra were analyzed using the Swanepoel method to quantify optical characteristics to assure reactive sputtering of the targets in a nitrogen environment as a viable direction of mirror construction. Possible further work include the use of other targets such as titanium oxide, and different chamber gas mixtures for finer control in the composition of the film layers.","abstract_has_math":false,"creators":["Bae, Dohyun"],"institution":"Massachusetts Institute of Technology","degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":"Massachusetts Institute of Technology. Department of Materials Science and Engineering.","school":null,"contributors":[],"advisors":["Jurgen Michel."],"committee_chairs":[],"committee_members":[],"year":2015,"date_issued":"2015","date_published":"2015","updated_at":"2026-07-22T22:22:11Z","subjects":["Materials Science and Engineering."],"languages":["eng"],"rights":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."],"rights_urls":["http://dspace.mit.edu/handle/1721.1/7582"],"identifier_entries":[]},"links":{"outbound_url":"http://hdl.handle.net/1721.1/98645","outbound_label":"Handle","outbound_source":"dc:identifier.uri"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor.advisor","label":"Advisor","values":["Jurgen Michel."]},{"key":"dc:contributor.department","label":"Department","values":["Massachusetts Institute of Technology. Department of Materials Science and Engineering."]},{"key":"dc:contributor.other","label":"Dc Contributor Other","values":["Massachusetts Institute of Technology. Department of Materials Science and Engineering."]},{"key":"dc:creator","label":"Author","values":["Bae, Dohyun"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date.accessioned","label":"Dc Date Accessioned","values":["2015-09-17T19:01:56Z"]},{"key":"dc:date.available","label":"Dc Date Available","values":["2015-09-17T19:01:56Z"]},{"key":"dc:date.issued","label":"Date","values":["2015"]},{"key":"dc:publisher","label":"Institution","values":["Massachusetts Institute of Technology"]},{"key":"dc:type","label":"Dc Type","values":["Thesis"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Materials Science and Engineering."]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language.iso","label":"Language (ISO)","values":["eng"]},{"key":"dc:rights","label":"Dc Rights","values":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."]},{"key":"dc:rights.uri","label":"Rights URI","values":["http://dspace.mit.edu/handle/1721.1/7582"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier.uri","label":"Identifier URI","values":["http://hdl.handle.net/1721.1/98645"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description","label":"Description","values":["Thesis: S.B., Massachusetts Institute of Technology, Department of Materials Science and Engineering, 2015.","Cataloged from PDF version of thesis.","Includes bibliographical references (page 37)."]},{"key":"dc:description.abstract","label":"Abstract","values":["Thin films in optical materials utilize the properties of multiple materials to obtain specific and fine-tuned transmission, absorption and reflectance at wavelengths. Dichroic mirrors exhibit very different reflectance and transmission rates at certain cut-off wavelengths, which can be adjusted using changes in layer materials and thickness. This is due to constructive optical interference between alternating layers of two thin films of different refractive indices. This study explored the sputtering methods of thin-film multilayers to form dichroic mirrors in the visible spectrum for future solar-cell applications. Silicon oxide and silicon nitride targets were selected as materials used in the sputtering process. The sputtered multilayers and films were then characterized and analyzed using spectrophotometry. The transmission spectrum of the initial multilayer depicted failure in transmission at wavelengths under 500nm. The components of the multilayer were then sputtered and analyzed to troubleshoot the problematic nitride films. Transmission spectra were utilized to select each following process, and both reactive sputtering and cosputtering were explored as means of creating nitride films with functional properties. Transmission spectra were analyzed using the Swanepoel method to quantify optical characteristics to assure reactive sputtering of the targets in a nitrogen environment as a viable direction of mirror construction. Possible further work include the use of other targets such as titanium oxide, and different chamber gas mixtures for finer control in the composition of the film layers."]},{"key":"dc:description.degree","label":"Dc Description Degree","values":["S.B."]},{"key":"dc:title","label":"Title","values":["Sputtering fabrication of silicon nitride and silicon oxide based dichroic mirrors"]}]}],"canonical_facts":{"dc:contributor.advisor":["Jurgen Michel."],"dc:contributor.department":["Massachusetts Institute of Technology. Department of Materials Science and Engineering."],"dc:contributor.other":["Massachusetts Institute of Technology. Department of Materials Science and Engineering."],"dc:creator":["Bae, Dohyun"],"dc:date.accessioned":["2015-09-17T19:01:56Z"],"dc:date.available":["2015-09-17T19:01:56Z"],"dc:date.issued":["2015"],"dc:description":["Thesis: S.B., Massachusetts Institute of Technology, Department of Materials Science and Engineering, 2015.","Cataloged from PDF version of thesis.","Includes bibliographical references (page 37)."],"dc:description.abstract":["Thin films in optical materials utilize the properties of multiple materials to obtain specific and fine-tuned transmission, absorption and reflectance at wavelengths. Dichroic mirrors exhibit very different reflectance and transmission rates at certain cut-off wavelengths, which can be adjusted using changes in layer materials and thickness. This is due to constructive optical interference between alternating layers of two thin films of different refractive indices. This study explored the sputtering methods of thin-film multilayers to form dichroic mirrors in the visible spectrum for future solar-cell applications. Silicon oxide and silicon nitride targets were selected as materials used in the sputtering process. The sputtered multilayers and films were then characterized and analyzed using spectrophotometry. The transmission spectrum of the initial multilayer depicted failure in transmission at wavelengths under 500nm. The components of the multilayer were then sputtered and analyzed to troubleshoot the problematic nitride films. Transmission spectra were utilized to select each following process, and both reactive sputtering and cosputtering were explored as means of creating nitride films with functional properties. Transmission spectra were analyzed using the Swanepoel method to quantify optical characteristics to assure reactive sputtering of the targets in a nitrogen environment as a viable direction of mirror construction. Possible further work include the use of other targets such as titanium oxide, and different chamber gas mixtures for finer control in the composition of the film layers."],"dc:description.degree":["S.B."],"dc:identifier.uri":["http://hdl.handle.net/1721.1/98645"],"dc:language.iso":["eng"],"dc:publisher":["Massachusetts Institute of Technology"],"dc:rights":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission."],"dc:rights.uri":["http://dspace.mit.edu/handle/1721.1/7582"],"dc:subject":["Materials Science and Engineering."],"dc:title":["Sputtering fabrication of silicon nitride and silicon oxide based dichroic mirrors"],"dc:type":["Thesis"]},"updated_at":"2026-07-22T22:22:11Z"}