Sub-20nm substrate patterning using a self-assembled nanocrystal template

A hexagonally close-packed monolayer of lead selenide quantum dots is presented as a template for patterning with a tunable resolution from 2 to 20nm. Spin-casting and micro-contact printing are resolved as methods of forming and depositing these monolayers of quantum dots through self-assembly. Four methods of templated patterning - shadowmasking, lift-off, selective ablation & nano-imprinting - using the quantum dot self-assembled monolayer are proposed and explored. The nano-imprinting technique is used to produce the smallest pattern in anodized alumina to date. The use of this nano-patterned anodized alumina as an etch mask is discussed as a means of patterning substrates within the 2 to 20nm range. The physics behind the possible modification of silicon's electronic band gap due to our nano-patterning is also presented.

Department dc:contributor.department

Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.

Grantor dc:publisher

Massachusetts Institute of Technology

Year dc:date.issued

2005

Author dc:creator

• Tabone, Ryan C

Advisor dc:contributor.advisor

• Vladimir Bulović.

• Electrical Engineering and Computer Science.

Statement dc:rights

• M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.

Licence dc:rights.uri

• http://dspace.mit.edu/handle/1721.1/7582

Language dc:language.iso

eng

Handle dc:identifier.uri

http://hdl.handle.net/1721.1/34123

OAI identifier oai:identifier

oai:dspace.mit.edu:1721.1/34123