{"id":{"repo_id":"mit","oai_identifier":"oai:dspace.mit.edu:1721.1/34123"},"canonical_url":"https://search.dev.ndltd.org/etd/mit/oai:dspace.mit.edu:1721.1/34123","repository":{"repo_id":"mit","name":"MIT","base_url":"https://dspace.mit.edu/oai/request"},"display":{"title":"Sub-20nm substrate patterning using a self-assembled nanocrystal template","abstract":"A hexagonally close-packed monolayer of lead selenide quantum dots is presented as a template for patterning with a tunable resolution from 2 to 20nm. Spin-casting and micro-contact printing are resolved as methods of forming and depositing these monolayers of quantum dots through self-assembly. Four methods of templated patterning - shadowmasking, lift-off, selective ablation & nano-imprinting - using the quantum dot self-assembled monolayer are proposed and explored. The nano-imprinting technique is used to produce the smallest pattern in anodized alumina to date. The use of this nano-patterned anodized alumina as an etch mask is discussed as a means of patterning substrates within the 2 to 20nm range. The physics behind the possible modification of silicon's electronic band gap due to our nano-patterning is also presented.","abstract_html":"A hexagonally close-packed monolayer of lead selenide quantum dots is presented as a template for patterning with a tunable resolution from 2 to 20nm. Spin-casting and micro-contact printing are resolved as methods of forming and depositing these monolayers of quantum dots through self-assembly. Four methods of templated patterning - shadowmasking, lift-off, selective ablation & nano-imprinting - using the quantum dot self-assembled monolayer are proposed and explored. The nano-imprinting technique is used to produce the smallest pattern in anodized alumina to date. The use of this nano-patterned anodized alumina as an etch mask is discussed as a means of patterning substrates within the 2 to 20nm range. The physics behind the possible modification of silicon's electronic band gap due to our nano-patterning is also presented.","abstract_has_math":false,"creators":["Tabone, Ryan C"],"institution":"Massachusetts Institute of Technology","degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":"Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.","school":null,"contributors":[],"advisors":["Vladimir Bulović."],"committee_chairs":[],"committee_members":[],"year":2005,"date_issued":"2005","date_published":"2005","updated_at":"2026-07-22T22:21:18Z","subjects":["Electrical Engineering and Computer Science."],"languages":["eng"],"rights":["M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. 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Spin-casting and micro-contact printing are resolved as methods of forming and depositing these monolayers of quantum dots through self-assembly. Four methods of templated patterning - shadowmasking, lift-off, selective ablation & nano-imprinting - using the quantum dot self-assembled monolayer are proposed and explored. The nano-imprinting technique is used to produce the smallest pattern in anodized alumina to date. The use of this nano-patterned anodized alumina as an etch mask is discussed as a means of patterning substrates within the 2 to 20nm range. 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