Implementation of an ultra deep x-ray lithography (UDXRL) system at CAMD

In this work, ultra-deep, several millimeter high microstructures in PMMA were fabricated, using deep X-ray lithography at the wiggler radiation source at the Center for Advanced Microstructures and Devices (CAMD). For the first time the concept of stacked exposures has been experimentally verified and tested. <br> <br>The work consists of two main tasks: The preparation of the necessary infrastructure and the conducting of the exposure experiments and their interpretation and comparison to results presented in earlier work.

Author dc:creator

• Aigeldinger, Georg

Contributors dc:contributor

• Menz, Wolfgang

• RTL
• LIGA
• Röntgenscanner
• Stapelbelichtung
• CAMD
• UDXRL
• DXRL
• XRL
• X-ray lithography
• Wiggler

Repository record source_url

https://freidok.uni-freiburg.de/data/407

OAI identifier oai:identifier

oai:freidok.uni-freiburg.de:407