{"id":{"repo_id":"freiburg-diss","oai_identifier":"oai:freidok.uni-freiburg.de:407"},"canonical_url":"https://search.dev.ndltd.org/etd/freiburg-diss/oai:freidok.uni-freiburg.de:407","repository":{"repo_id":"freiburg-diss","name":"University of Freiburg","base_url":"https://freidok.uni-freiburg.de/oai/oai2.php"},"display":{"title":"Implementation of an ultra deep x-ray lithography (UDXRL) system at CAMD","abstract":"In this work, ultra-deep, several millimeter high microstructures in PMMA were fabricated, using deep X-ray lithography at the wiggler radiation source at the Center for Advanced Microstructures and Devices (CAMD). For the first time the concept of stacked exposures has been experimentally verified and tested. <br> <br>The work consists of two main tasks: The preparation of the necessary infrastructure and the conducting of the exposure experiments and their interpretation and comparison to results presented in earlier work.","abstract_html":"In this work, ultra-deep, several millimeter high microstructures in PMMA were fabricated, using deep X-ray lithography at the wiggler radiation source at the Center for Advanced Microstructures and Devices (CAMD). For the first time the concept of stacked exposures has been experimentally verified and tested. &lt;br&gt; &lt;br&gt;The work consists of two main tasks: The preparation of the necessary infrastructure and the conducting of the exposure experiments and their interpretation and comparison to results presented in earlier work.","abstract_has_math":false,"creators":["Aigeldinger, Georg"],"institution":null,"degree_name":null,"degree_level":null,"degree_discipline":null,"degree_department":null,"school":null,"contributors":["Menz, Wolfgang"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":null,"date_issued":"","date_published":null,"updated_at":"2026-07-24T02:21:41Z","subjects":["RTL","LIGA","Röntgenscanner","Stapelbelichtung","CAMD","UDXRL","DXRL","XRL","X-ray lithography","Wiggler"],"languages":[],"rights":[],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":"https://freidok.uni-freiburg.de/data/407","outbound_label":"Repository record","outbound_source":"source_url"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Menz, Wolfgang"]},{"key":"dc:creator","label":"Author","values":["Aigeldinger, Georg"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:type","label":"Dc Type","values":["DoctoralThesis"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["RTL","LIGA","Röntgenscanner","Stapelbelichtung","CAMD","UDXRL","DXRL","XRL","X-ray lithography","Wiggler"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["In this work, ultra-deep, several millimeter high microstructures in PMMA were fabricated, using deep X-ray lithography at the wiggler radiation source at the Center for Advanced Microstructures and Devices (CAMD). For the first time the concept of stacked exposures has been experimentally verified and tested. <br> <br>The work consists of two main tasks: The preparation of the necessary infrastructure and the conducting of the exposure experiments and their interpretation and comparison to results presented in earlier work."]},{"key":"dc:format.medium","label":"Dc Format Medium","values":["application/pdf"]},{"key":"dc:title","label":"Title","values":["Implementation of an ultra deep x-ray lithography (UDXRL) system at CAMD","Implementierung eines Systems zur ultratiefen Röntgenlithographie (UDXRL) am CAMD"]}]}],"canonical_facts":{"dc:contributor":["Menz, Wolfgang"],"dc:creator":["Aigeldinger, Georg"],"dc:description.abstract":["In this work, ultra-deep, several millimeter high microstructures in PMMA were fabricated, using deep X-ray lithography at the wiggler radiation source at the Center for Advanced Microstructures and Devices (CAMD). For the first time the concept of stacked exposures has been experimentally verified and tested. <br> <br>The work consists of two main tasks: The preparation of the necessary infrastructure and the conducting of the exposure experiments and their interpretation and comparison to results presented in earlier work."],"dc:format.medium":["application/pdf"],"dc:subject":["RTL","LIGA","Röntgenscanner","Stapelbelichtung","CAMD","UDXRL","DXRL","XRL","X-ray lithography","Wiggler"],"dc:title":["Implementation of an ultra deep x-ray lithography (UDXRL) system at CAMD","Implementierung eines Systems zur ultratiefen Röntgenlithographie (UDXRL) am CAMD"],"dc:type":["DoctoralThesis"]},"updated_at":"2026-07-24T02:21:41Z"}