Evaluation of microwave microscopy for dielectric characterisation

A widely used analytical, image charge, model of the SNMM was analysed for the first time in terms of its ability to predict the response of the SNMM to both bulk and thin film dielectrics. For the first time it was shown that the uncertainty in fitting to the model reduces from 10% to 5% when the length of the tip protruding from within the cavity is reduced from 2mm to 1mm. A 5% uncertainty in fitting to the image charge model for the measurement of the relative permittivity of bulk samples is demonstrated.

Name dc:type.qualificationname

d_ph

Level dc:type.qualificationlevel

d_ph

Grantor dc:publisher.institution

University of Birmingham

Year dc:date.issued

2010

Author dc:creator

• Barker, Duncan James

• TK Electrical engineering. Electronics Nuclear engineering
• TA Engineering (General). Civil engineering (General)
• QC Physics