{"id":{"repo_id":"wvu","oai_identifier":"oai:researchrepository.wvu.edu:etd-2617"},"canonical_url":"https://search.dev.ndltd.org/etd/wvu/oai:researchrepository.wvu.edu:etd-2617","repository":{"repo_id":"wvu","name":"West Virginia University","base_url":"https://researchrepository.wvu.edu/do/oai/"},"display":{"title":"Investigation of fabrication process development for integrated optical grating structures","abstract":"Sub-micron optical gratings are essential integrated elements to couple light into waveguides and for optical monitoring of microfluidic channels or MEMS devices. Since the required features in the sub-micron regime are difficult to achieve by mechanical ruling and photolithography, alternate fabrication techniques are investigated. Exposure by e-beam and laser are two direct write methods which are used. These methods preclude the need of a mask, require few processing steps, and can be used to write features of sizes desired for optical gratings. In this research, we explore and develop processes to create sub-micron gratings by both these methods. A resist bi-layer is patterned by e-beam exposure. After metal lift-off, the grating structure is transferred into silicon by reactive ion etching (RIE). Rectangular gratings with 200nm--500nm feature size and 50% pitch were successfully fabricated. Borofloat, silica and alumina have been etched using chrome as a mask with vertical sidewalls. Grating structures of any pitch can be created in these materials using e-beam writing in resist and RIE. A 255nm copper vapor laser was used to ablate lines in borosilicate glass.","abstract_html":"Sub-micron optical gratings are essential integrated elements to couple light into waveguides and for optical monitoring of microfluidic channels or MEMS devices. Since the required features in the sub-micron regime are difficult to achieve by mechanical ruling and photolithography, alternate fabrication techniques are investigated. Exposure by e-beam and laser are two direct write methods which are used. These methods preclude the need of a mask, require few processing steps, and can be used to write features of sizes desired for optical gratings. In this research, we explore and develop processes to create sub-micron gratings by both these methods. A resist bi-layer is patterned by e-beam exposure. After metal lift-off, the grating structure is transferred into silicon by reactive ion etching (RIE). Rectangular gratings with 200nm--500nm feature size and 50% pitch were successfully fabricated. Borofloat, silica and alumina have been etched using chrome as a mask with vertical sidewalls. Grating structures of any pitch can be created in these materials using e-beam writing in resist and RIE. A 255nm copper vapor laser was used to ablate lines in borosilicate glass.","abstract_has_math":false,"creators":["Pisharoty, Divya"],"institution":null,"degree_name":"MS","degree_level":"Thesis","degree_discipline":"Lane Department of Computer Science and Electrical Engineering","degree_department":null,"school":null,"contributors":["Lawrence A. Hornak."],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2005,"date_issued":"2005-05-01T07:00:00Z","date_published":"2005-05-01T07:00:00Z","updated_at":"2026-07-24T06:15:55Z","subjects":["Electrical engineering","Optics"],"languages":[],"rights":[],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["https://researchrepository.wvu.edu/etd/1614"],"render_values":[{"text":"https://researchrepository.wvu.edu/etd/1614","href":"https://researchrepository.wvu.edu/etd/1614","code":true}]}]},"links":{"outbound_url":"https://doi.org/10.33915/etd.1614","outbound_label":"DOI","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Lawrence A. Hornak."]},{"key":"dc:creator","label":"Author","values":["Pisharoty, Divya"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date.available","label":"Dc Date Available","values":["2019-01-17T08:00:00Z"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Lane Department of Computer Science and Electrical Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Thesis"]},{"key":"thesis:degree_name","label":"Degree Name","values":["MS"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["Electrical engineering","Optics"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["https://doi.org/10.33915/etd.1614","https://researchrepository.wvu.edu/etd/1614"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["Sub-micron optical gratings are essential integrated elements to couple light into waveguides and for optical monitoring of microfluidic channels or MEMS devices. Since the required features in the sub-micron regime are difficult to achieve by mechanical ruling and photolithography, alternate fabrication techniques are investigated. Exposure by e-beam and laser are two direct write methods which are used. These methods preclude the need of a mask, require few processing steps, and can be used to write features of sizes desired for optical gratings. In this research, we explore and develop processes to create sub-micron gratings by both these methods. A resist bi-layer is patterned by e-beam exposure. After metal lift-off, the grating structure is transferred into silicon by reactive ion etching (RIE). Rectangular gratings with 200nm--500nm feature size and 50% pitch were successfully fabricated. Borofloat, silica and alumina have been etched using chrome as a mask with vertical sidewalls. Grating structures of any pitch can be created in these materials using e-beam writing in resist and RIE. A 255nm copper vapor laser was used to ablate lines in borosilicate glass."]},{"key":"dc:title","label":"Title","values":["Investigation of fabrication process development for integrated optical grating structures"]}]}],"canonical_facts":{"dc:contributor":["Lawrence A. Hornak."],"dc:creator":["Pisharoty, Divya"],"dc:date.available":["2019-01-17T08:00:00Z"],"dc:description.abstract":["Sub-micron optical gratings are essential integrated elements to couple light into waveguides and for optical monitoring of microfluidic channels or MEMS devices. Since the required features in the sub-micron regime are difficult to achieve by mechanical ruling and photolithography, alternate fabrication techniques are investigated. Exposure by e-beam and laser are two direct write methods which are used. These methods preclude the need of a mask, require few processing steps, and can be used to write features of sizes desired for optical gratings. In this research, we explore and develop processes to create sub-micron gratings by both these methods. A resist bi-layer is patterned by e-beam exposure. After metal lift-off, the grating structure is transferred into silicon by reactive ion etching (RIE). Rectangular gratings with 200nm--500nm feature size and 50% pitch were successfully fabricated. Borofloat, silica and alumina have been etched using chrome as a mask with vertical sidewalls. Grating structures of any pitch can be created in these materials using e-beam writing in resist and RIE. A 255nm copper vapor laser was used to ablate lines in borosilicate glass."],"dc:identifier":["https://doi.org/10.33915/etd.1614","https://researchrepository.wvu.edu/etd/1614"],"dc:subject":["Electrical engineering","Optics"],"dc:title":["Investigation of fabrication process development for integrated optical grating structures"],"thesis:degree_discipline":["Lane Department of Computer Science and Electrical Engineering"],"thesis:degree_level":["Thesis"],"thesis:degree_name":["MS"]},"updated_at":"2026-07-24T06:15:55Z"}