{"id":{"repo_id":"vcu","oai_identifier":"oai:scholarscompass.vcu.edu:etd-1882"},"canonical_url":"https://search.dev.ndltd.org/etd/vcu/oai:scholarscompass.vcu.edu:etd-1882","repository":{"repo_id":"vcu","name":"Virginia Commonwealth University","base_url":"https://scholarscompass.vcu.edu/do/oai/"},"display":{"title":"High Quality ZnO Epitaxial Grown By Plasma Assisted Molecular Beam Epitaxy","abstract":"Described in this thesis are the growth and characterization of high quality ZnO epitaxy layers.Zinc oxide (ZnO) epitaxy layers were grown on sapphire and epi-GaN substrates respectively, using plasma assisted molecular beam epitaxy (MBE) . Various growth conditions, such as growth temperature, II/VI ratio, and buffer layers, were employed to optimize the quality of the ZnO film. The subsequent characterization of the films was carried out to evaluate the surface, optical and crystalline properties of the film, using AFM, SEM, PL and XRD techniques. It was found out that the high quality of the ZnO film was grown on epi-GaN substrates under the Low temperature of ~ 300 degrees C, flash annealing up to ~680 degrees C, followed by high temperature growth at ~600 degrees C.","abstract_html":"Described in this thesis are the growth and characterization of high quality ZnO epitaxy layers.Zinc oxide (ZnO) epitaxy layers were grown on sapphire and epi-GaN substrates respectively, using plasma assisted molecular beam epitaxy (MBE) . Various growth conditions, such as growth temperature, II/VI ratio, and buffer layers, were employed to optimize the quality of the ZnO film. The subsequent characterization of the films was carried out to evaluate the surface, optical and crystalline properties of the film, using AFM, SEM, PL and XRD techniques. It was found out that the high quality of the ZnO film was grown on epi-GaN substrates under the Low temperature of ~ 300 degrees C, flash annealing up to ~680 degrees C, followed by high temperature growth at ~600 degrees C.","abstract_has_math":false,"creators":["Zhang, Yun"],"institution":null,"degree_name":"Master of Science","degree_level":"Thesis","degree_discipline":"Electrical Engineering","degree_department":null,"school":null,"contributors":["Dr. Hadis Morkoc"],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2004,"date_issued":"2004-01-01T08:00:00Z","date_published":"2004-01-01T08:00:00Z","updated_at":"2026-07-24T05:54:30Z","subjects":["EPITAXY","MBE","ZnO","Electrical and Computer Engineering","Engineering"],"languages":[],"rights":["© The Author"],"rights_urls":[],"identifier_entries":[{"key":"dc:identifier","label":"Identifier","values":["https://scholarscompass.vcu.edu/etd/883"],"render_values":[{"text":"https://scholarscompass.vcu.edu/etd/883","href":"https://scholarscompass.vcu.edu/etd/883","code":true}]}]},"links":{"outbound_url":"https://doi.org/10.25772/XK8P-S218","outbound_label":"DOI","outbound_source":"dc:identifier"},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:contributor","label":"Contributor","values":["Dr. Hadis Morkoc"]},{"key":"dc:creator","label":"Author","values":["Zhang, Yun"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date.available","label":"Dc Date Available","values":["2014-07-09T07:00:00Z"]},{"key":"thesis:degree_discipline","label":"Discipline","values":["Electrical Engineering"]},{"key":"thesis:degree_level","label":"Degree Level","values":["Thesis"]},{"key":"thesis:degree_name","label":"Degree Name","values":["Master of Science"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["EPITAXY","MBE","ZnO","Electrical and Computer Engineering","Engineering"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:rights","label":"Dc Rights","values":["© The Author"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier","label":"Identifier","values":["https://doi.org/10.25772/XK8P-S218","https://scholarscompass.vcu.edu/etd/883"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["Described in this thesis are the growth and characterization of high quality ZnO epitaxy layers.Zinc oxide (ZnO) epitaxy layers were grown on sapphire and epi-GaN substrates respectively, using plasma assisted molecular beam epitaxy (MBE) . Various growth conditions, such as growth temperature, II/VI ratio, and buffer layers, were employed to optimize the quality of the ZnO film. The subsequent characterization of the films was carried out to evaluate the surface, optical and crystalline properties of the film, using AFM, SEM, PL and XRD techniques. It was found out that the high quality of the ZnO film was grown on epi-GaN substrates under the Low temperature of ~ 300 degrees C, flash annealing up to ~680 degrees C, followed by high temperature growth at ~600 degrees C."]},{"key":"dc:title","label":"Title","values":["High Quality ZnO Epitaxial Grown By Plasma Assisted Molecular Beam Epitaxy"]}]}],"canonical_facts":{"dc:contributor":["Dr. Hadis Morkoc"],"dc:creator":["Zhang, Yun"],"dc:date.available":["2014-07-09T07:00:00Z"],"dc:description.abstract":["Described in this thesis are the growth and characterization of high quality ZnO epitaxy layers.Zinc oxide (ZnO) epitaxy layers were grown on sapphire and epi-GaN substrates respectively, using plasma assisted molecular beam epitaxy (MBE) . Various growth conditions, such as growth temperature, II/VI ratio, and buffer layers, were employed to optimize the quality of the ZnO film. The subsequent characterization of the films was carried out to evaluate the surface, optical and crystalline properties of the film, using AFM, SEM, PL and XRD techniques. It was found out that the high quality of the ZnO film was grown on epi-GaN substrates under the Low temperature of ~ 300 degrees C, flash annealing up to ~680 degrees C, followed by high temperature growth at ~600 degrees C."],"dc:identifier":["https://doi.org/10.25772/XK8P-S218","https://scholarscompass.vcu.edu/etd/883"],"dc:rights":["© The Author"],"dc:subject":["EPITAXY","MBE","ZnO","Electrical and Computer Engineering","Engineering"],"dc:title":["High Quality ZnO Epitaxial Grown By Plasma Assisted Molecular Beam Epitaxy"],"thesis:degree_discipline":["Electrical Engineering"],"thesis:degree_level":["Thesis"],"thesis:degree_name":["Master of Science"]},"updated_at":"2026-07-24T05:54:30Z"}