{"id":{"repo_id":"uthm","oai_identifier":"oai:eprints.uthm.edu.my:1722"},"canonical_url":"https://search.dev.ndltd.org/etd/uthm/oai:eprints.uthm.edu.my:1722","repository":{"repo_id":"uthm","name":"Universiti Tun Hussein Onn Malaysia","base_url":"http://eprints.uthm.edu.my/cgi/oai2"},"display":{"title":"Fabrication of smart glass electrochromic device using rf magnetron sputtering","abstract":"Electrochromic device is an important functional device to control the amount of light through a glass. It usually used in sunlight control window glazing for buildings and automobile. The important feature of electrochromic glass is the ability to response toward the apply voltage in shortest time, and endurance to maintain in color shape after apply voltage. In this thesis, the oxygen gas percentage is optimized during the fabrication of tungsten trioxide (WO3) as an electrochromic glass for window glazing application by using RF magnetron sputtering. The oxygen flow rate for the deposition is varied from 10sccm -22sccm which is 25%, 27%, 30%, and 35% of oxygen flow. The structures of WO3 were investigated using X-Ray diffraction, Field effect scanning electron microscopy (Fe-Sem) and Atomic force microscopy (AFM). The electrochromic properties were characterized by a cyclic voltammogram and UV-Vis absorption spectra. The results show that nanocrystalline film with particle size of 51.54nm was deposited at 27% oxygen flow rate has the largest charge capacity and coloration efficiency among the others. The time respond taken for complete coloration at 4V is 2second. This result is a starting point for future work such as optimizing the film thickness or doping by other metals.","abstract_html":"Electrochromic device is an important functional device to control the amount of light through a glass. It usually used in sunlight control window glazing for buildings and automobile. The important feature of electrochromic glass is the ability to response toward the apply voltage in shortest time, and endurance to maintain in color shape after apply voltage. In this thesis, the oxygen gas percentage is optimized during the fabrication of tungsten trioxide (WO3) as an electrochromic glass for window glazing application by using RF magnetron sputtering. The oxygen flow rate for the deposition is varied from 10sccm -22sccm which is 25%, 27%, 30%, and 35% of oxygen flow. The structures of WO3 were investigated using X-Ray diffraction, Field effect scanning electron microscopy (Fe-Sem) and Atomic force microscopy (AFM). The electrochromic properties were characterized by a cyclic voltammogram and UV-Vis absorption spectra. The results show that nanocrystalline film with particle size of 51.54nm was deposited at 27% oxygen flow rate has the largest charge capacity and coloration efficiency among the others. The time respond taken for complete coloration at 4V is 2second. This result is a starting point for future work such as optimizing the film thickness or doping by other metals.","abstract_has_math":false,"creators":["Abdullah, Siti Ashraf"],"institution":"Universiti Tun Hussein Onn Malaysia","degree_name":"mphil","degree_level":"masters","degree_discipline":null,"degree_department":null,"school":null,"contributors":[],"advisors":[],"committee_chairs":[],"committee_members":[],"year":2014,"date_issued":"2014-01","date_published":"2014-01","updated_at":"2026-07-24T05:48:41Z","subjects":["TA Engineering (General). Civil engineering (General)","TA1501-1820 Applied optics. Photonics"],"languages":["en"],"rights":[],"rights_urls":[],"identifier_entries":[]},"links":{"outbound_url":null,"outbound_label":null,"outbound_source":null},"metadata_groups":[{"id":"people","label":"People","entries":[{"key":"dc:creator","label":"Author","values":["Abdullah, Siti Ashraf"]}]},{"id":"academic_context","label":"Academic Context","entries":[{"key":"dc:date","label":"Dc Date","values":["2014-01"]},{"key":"dc:date.issued","label":"Date","values":["2014-01"]},{"key":"dc:publisher.department","label":"Dc Publisher Department","values":["Fakulti Kejuruteraan Elektrik dan Elektronik"]},{"key":"dc:publisher.institution","label":"Dc Publisher Institution","values":["Universiti Tun Hussein Onn Malaysia"]},{"key":"dc:relation.isreferencedby","label":"Dc Relation Isreferencedby","values":["http://eprints.uthm.edu.my/1722/"]},{"key":"dc:type","label":"Dc Type","values":["Thesis"]},{"key":"dc:type.qualificationlevel","label":"Dc Type Qualificationlevel","values":["masters"]},{"key":"dc:type.qualificationname","label":"Dc Type Qualificationname","values":["mphil"]}]},{"id":"subjects_keywords","label":"Subjects and Keywords","entries":[{"key":"dc:subject","label":"Dc Subject","values":["TA Engineering (General). Civil engineering (General)","TA1501-1820 Applied optics. Photonics"]}]},{"id":"language_rights","label":"Language and Rights","entries":[{"key":"dc:language","label":"Dc Language","values":["en"]}]},{"id":"identifiers","label":"Identifiers","entries":[{"key":"dc:identifier.uri","label":"Identifier URI","values":["http://eprints.uthm.edu.my/1722/2/24p%20SITI%20ASHRAF%20ABDULLAH.pdf","http://eprints.uthm.edu.my/1722/1/SITI%20ASHRAF%20ABDULLAH%20COPYRIGHT%20DECLARATION.pdf","http://eprints.uthm.edu.my/1722/3/SITI%20ASHRAF%20ABDULLAH%20WATERMARK.pdf"]}]},{"id":"additional","label":"Additional Metadata","entries":[{"key":"dc:description.abstract","label":"Abstract","values":["Electrochromic device is an important functional device to control the amount of light through a glass. It usually used in sunlight control window glazing for buildings and automobile. The important feature of electrochromic glass is the ability to response toward the apply voltage in shortest time, and endurance to maintain in color shape after apply voltage. In this thesis, the oxygen gas percentage is optimized during the fabrication of tungsten trioxide (WO3) as an electrochromic glass for window glazing application by using RF magnetron sputtering. The oxygen flow rate for the deposition is varied from 10sccm -22sccm which is 25%, 27%, 30%, and 35% of oxygen flow. The structures of WO3 were investigated using X-Ray diffraction, Field effect scanning electron microscopy (Fe-Sem) and Atomic force microscopy (AFM). The electrochromic properties were characterized by a cyclic voltammogram and UV-Vis absorption spectra. The results show that nanocrystalline film with particle size of 51.54nm was deposited at 27% oxygen flow rate has the largest charge capacity and coloration efficiency among the others. The time respond taken for complete coloration at 4V is 2second. This result is a starting point for future work such as optimizing the film thickness or doping by other metals."]},{"key":"dc:format","label":"Dc Format","values":["text"]},{"key":"dc:title","label":"Title","values":["Fabrication of smart glass electrochromic device using rf magnetron sputtering"]}]}],"canonical_facts":{"dc:creator":["Abdullah, Siti Ashraf"],"dc:date":["2014-01"],"dc:date.issued":["2014-01"],"dc:description.abstract":["Electrochromic device is an important functional device to control the amount of light through a glass. It usually used in sunlight control window glazing for buildings and automobile. The important feature of electrochromic glass is the ability to response toward the apply voltage in shortest time, and endurance to maintain in color shape after apply voltage. In this thesis, the oxygen gas percentage is optimized during the fabrication of tungsten trioxide (WO3) as an electrochromic glass for window glazing application by using RF magnetron sputtering. The oxygen flow rate for the deposition is varied from 10sccm -22sccm which is 25%, 27%, 30%, and 35% of oxygen flow. The structures of WO3 were investigated using X-Ray diffraction, Field effect scanning electron microscopy (Fe-Sem) and Atomic force microscopy (AFM). The electrochromic properties were characterized by a cyclic voltammogram and UV-Vis absorption spectra. The results show that nanocrystalline film with particle size of 51.54nm was deposited at 27% oxygen flow rate has the largest charge capacity and coloration efficiency among the others. The time respond taken for complete coloration at 4V is 2second. This result is a starting point for future work such as optimizing the film thickness or doping by other metals."],"dc:format":["text"],"dc:identifier.uri":["http://eprints.uthm.edu.my/1722/2/24p%20SITI%20ASHRAF%20ABDULLAH.pdf","http://eprints.uthm.edu.my/1722/1/SITI%20ASHRAF%20ABDULLAH%20COPYRIGHT%20DECLARATION.pdf","http://eprints.uthm.edu.my/1722/3/SITI%20ASHRAF%20ABDULLAH%20WATERMARK.pdf"],"dc:language":["en"],"dc:publisher.department":["Fakulti Kejuruteraan Elektrik dan Elektronik"],"dc:publisher.institution":["Universiti Tun Hussein Onn Malaysia"],"dc:relation.isreferencedby":["http://eprints.uthm.edu.my/1722/"],"dc:subject":["TA Engineering (General). Civil engineering (General)","TA1501-1820 Applied optics. Photonics"],"dc:title":["Fabrication of smart glass electrochromic device using rf magnetron sputtering"],"dc:type":["Thesis"],"dc:type.qualificationlevel":["masters"],"dc:type.qualificationname":["mphil"]},"updated_at":"2026-07-24T05:48:41Z"}