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University of North Texas

Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate

Abstract

dc:description

The aim of this thesis was to investigate the physical and electrochemical properties of sub monolayer and monolayer of copper deposition on the polycrystalline iridium, ruthenium and its conductive oxide. The electrochemical methods cyclic voltammetry (CV) and chronocoulometry were used to study the under potential deposition. The electrochemical methods to oxidize the ruthenium metal are presented, and the electrochemical properties of the oxide ruthenium are studied. The full range of CV is presented in this thesis, and the distances between the stripping bulk peak and stripping UPD peak in various concentration of CuSO4 on iridium, ruthenium and its conductive oxide are shown, which yields thermodynamic data on relative difference of bonding strength between Cu-Ru/Ir atoms and Cu-Cu atoms. The monolayer of UPD on ruthenium is about 0.5mL, and on oxidized ruthenium is around 0.9mL to 1.0mL. The conductive oxide ruthenium presents the similar properties of ruthenium metal. The pH effect of stripping bulk peak and stripping UPD peak of copper deposition on ruthenium and oxide ruthenium was investigated. The stripping UPD peak and stripping bulk peak disappeared after the pH ≥ 3 on oxidized ruthenium electrode, and a new peak appeared, which means the condition of pH is very important. The results show that the Cl- , SO42- , Br- will affect the position of stripping bulk peak and stripping UPD peak: the stripping bulk peak will shift and decrease if the concentration of halide ions is increasing, and the monolayer of UPD will increase at the same time.

Degree

thesis:*
Grantor dc:publisher
University of North Texas
Year dc:date
2003

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Huang, Long
Contributors dc:contributor
  • Chyan, Oliver M. R.
  • Golden, Teresa D.

Subjects

dc:subject × 8

Rights

dc:rights
Statement dc:rights
  • Public
  • Copyright
  • Huang, Long
  • Copyright is held by the author, unless otherwise noted. All rights reserved.
Language dc:language
English

Identifiers

dc:identifier.*
Identifier
oclc: 54479817
https://digital.library.unt.edu/ark:/67531/metadc4416/
ark: ark:/67531/metadc4416
OAI identifier oai:identifier
info:ark/67531/metadc4416

Chain of custody

source
Harvested from
University of North Texas
Base URL
digital.library.unt.edu/oai/
Last updated
2026-07-24
Source record
OAI-PMH GetRecord
citation

Huang, Long. Copper Electrodeposition on Iridium, Ruthenium and Its Conductive Oxide Substrate. University of North Texas, 2003. https://doi.org/10.12794/metadc4416