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University of New Mexico

Atomic-level investigation of surface processes governing SiGe wetting layer formation using STM/STS

Abstract

dc:description.abstract

Upon sub-monolayer Ge deposition on the 2xn reconstructed SiGe alloy wetting layer at room temperature, the predominant adspecies observed are so-called addimer chain structures (ADCSs). Polarity-switching scanning tunneling microscopy (STM) is used to study ADCSs, as they only appear in empty-state images. ADCSs are dilute structures comprising type-C addimers that reside in neighboring troughs and extend along all equivalent <130> directions of the surface, giving rise to a zigzagged morphology. ADCSs exhibit localized movements, wherein their rearrangements are strongly coupled with the structure of the underlying substrate dimers. At elevated temperatures, ADCSs are observed to transition to compact epitaxial segments of the next atomic layer, indicating their metastability. By measuring ADCS transition rates over the temperature range of 90&#8212;150&#176;C, an activation energy of 0.7 &#177; 0.2 eV and an associated prefactor of 5 x 104&#177;2 s&#8212;1 are computed. Both of these kinetic values are quite low as compared to typical surface diffusion phenomena, and we suggest that the transition mechanism is likely complex and multi-bodied, requiring concerted rearrangements of the addimer chain with underlying substrate dimers. To achieve chemical contrast between Si and Ge in the alloy wetting layer, preliminary investigations using scanning tunneling spectroscopy were conducted. A variety of surfaces with increasing Ge compositions were investigated. It is shown that for low Ge compositions of about 0.1 monolayers (ML) or below, low-bias empty-state STM imaging is useful in determining the locations of Ge intermixing. At higher compositions (0.25&#8212;0.5 ML), considerable contrast and structure in the conductance images is observed that corresponds to structure in STM images and the Ge content of the surface. For compositions of 1.5 ML, which give rise to a fully-developed 2xn reconstruction, the only structure in conductance images corresponds to the locations of the dimer vacancy lines, perhaps indicating sub-surface Ge depletion zones.

Degree

thesis:*
Name thesis:degree_name
Chemical Engineering
Level thesis:degree_level
Thesis
Discipline thesis:degree_discipline
Chemical and Biological Engineering
Year
2010

Author and committee

dc:creator, dc:contributor.*
Author dc:creator
  • Solis, Kyle J.
Contributors dc:contributor
  • Han, Sang M.
  • Swartzentruber, Brian S.
  • Balakrishnan, Ganesh

Subjects

dc:subject × 16

Rights

Language dc:language
English

Identifiers

dc:identifier.*
OAI identifier oai:identifier
oai:digitalrepository.unm.edu:cbe_etds-1032

Chain of custody

source
Harvested from
University of New Mexico
Base URL
digitalrepository.unm.edu/do/oai/
Last updated
2026-07-24
Source record
OAI-PMH GetRecord
citation

Solis, Kyle J.. Atomic-level investigation of surface processes governing SiGe wetting layer formation using STM/STS. Thesis thesis, 2010. http://hdl.handle.net/1928/10851