INVESTIGATION AND MODELLING OF ADVANCED THERMAL PROCESSES FOR THE ACTIVATION OF DOPANT FROM IONIC IMPLANTATION IN SEMICONDUCTOR DEVICES
type: CreativeWork
author: Olivero, Paolo
author: Cepparrone, Enrico
language: eng
keywords: Settore FIS/03 - Fisica della Materia
date published: 2022-07-01
date modified: 2026-07-24T05:23:34Z
provider: Università di Torino
publisher: Networked Digital Library of Theses and Dissertations
type: WebPage
source organization: Università degli Studi di Torino

PropertyValue
property ID: Handle
value: https://hdl.handle.net/2318/2017081